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Title: High quality oxide films on substrates

Abstract

A method for providing an oxide film of a material on the surface of a substrate using a reactive deposition of the material onto the substrate surface in the presence of a solid or liquid layer of an oxidizing gas. The oxidizing gas is provided on the substrate surface in an amount sufficient to dissipate the latent heat of condensation occurring during deposition as well as creating a favorable oxidizing environment for the material.

Inventors:
 [1];  [2];  [3]
  1. Middle Island, NY
  2. Center Moriches, NY
  3. Henrietta, NY
Issue Date:
Research Org.:
ASSOC UNIVERSITIES INC
OSTI Identifier:
869138
Patent Number(s):
5282903
Assignee:
Associated Universities, Inc. (Washington, DC)
DOE Contract Number:  
AC02-76CH00016
Resource Type:
Patent
Country of Publication:
United States
Language:
English
Subject:
quality; oxide; films; substrates; method; providing; film; material; surface; substrate; reactive; deposition; presence; solid; liquid; layer; oxidizing; gas; provided; amount; sufficient; dissipate; latent; heat; condensation; occurring; creating; favorable; environment; liquid layer; latent heat; oxide films; oxidizing gas; substrate surface; oxide film; amount sufficient; quality oxide; reactive deposition; oxidizing environment; /148/

Citation Formats

Ruckman, Mark W, Strongin, Myron, and Gao, Yong L. High quality oxide films on substrates. United States: N. p., 1994. Web.
Ruckman, Mark W, Strongin, Myron, & Gao, Yong L. High quality oxide films on substrates. United States.
Ruckman, Mark W, Strongin, Myron, and Gao, Yong L. Sat . "High quality oxide films on substrates". United States. https://www.osti.gov/servlets/purl/869138.
@article{osti_869138,
title = {High quality oxide films on substrates},
author = {Ruckman, Mark W and Strongin, Myron and Gao, Yong L},
abstractNote = {A method for providing an oxide film of a material on the surface of a substrate using a reactive deposition of the material onto the substrate surface in the presence of a solid or liquid layer of an oxidizing gas. The oxidizing gas is provided on the substrate surface in an amount sufficient to dissipate the latent heat of condensation occurring during deposition as well as creating a favorable oxidizing environment for the material.},
doi = {},
journal = {},
number = ,
volume = ,
place = {United States},
year = {1994},
month = {1}
}

Patent:

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