High quality oxide films on substrates
Abstract
A method for providing an oxide film of a material on the surface of a substrate using a reactive deposition of the material onto the substrate surface in the presence of a solid or liquid layer of an oxidizing gas. The oxidizing gas is provided on the substrate surface in an amount sufficient to dissipate the latent heat of condensation occurring during deposition as well as creating a favorable oxidizing environment for the material.
- Inventors:
-
- Middle Island, NY
- Center Moriches, NY
- Henrietta, NY
- Issue Date:
- Research Org.:
- Associated Universities, Inc., Upton, NY (United States)
- OSTI Identifier:
- 869138
- Patent Number(s):
- 5282903
- Assignee:
- Associated Universities, Inc. (Washington, DC)
- Patent Classifications (CPCs):
-
H - ELECTRICITY H01 - BASIC ELECTRIC ELEMENTS H01L - SEMICONDUCTOR DEVICES
Y - NEW / CROSS SECTIONAL TECHNOLOGIES Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC Y10S - TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- DOE Contract Number:
- AC02-76CH00016
- Resource Type:
- Patent
- Country of Publication:
- United States
- Language:
- English
- Subject:
- quality; oxide; films; substrates; method; providing; film; material; surface; substrate; reactive; deposition; presence; solid; liquid; layer; oxidizing; gas; provided; amount; sufficient; dissipate; latent; heat; condensation; occurring; creating; favorable; environment; liquid layer; latent heat; oxide films; oxidizing gas; substrate surface; oxide film; amount sufficient; quality oxide; reactive deposition; oxidizing environment; /148/
Citation Formats
Ruckman, Mark W, Strongin, Myron, and Gao, Yong L. High quality oxide films on substrates. United States: N. p., 1994.
Web.
Ruckman, Mark W, Strongin, Myron, & Gao, Yong L. High quality oxide films on substrates. United States.
Ruckman, Mark W, Strongin, Myron, and Gao, Yong L. Sat .
"High quality oxide films on substrates". United States. https://www.osti.gov/servlets/purl/869138.
@article{osti_869138,
title = {High quality oxide films on substrates},
author = {Ruckman, Mark W and Strongin, Myron and Gao, Yong L},
abstractNote = {A method for providing an oxide film of a material on the surface of a substrate using a reactive deposition of the material onto the substrate surface in the presence of a solid or liquid layer of an oxidizing gas. The oxidizing gas is provided on the substrate surface in an amount sufficient to dissipate the latent heat of condensation occurring during deposition as well as creating a favorable oxidizing environment for the material.},
doi = {},
journal = {},
number = ,
volume = ,
place = {United States},
year = {Sat Jan 01 00:00:00 EST 1994},
month = {Sat Jan 01 00:00:00 EST 1994}
}
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Works referenced in this record:
Growth of Al oxide layers on GaAs (100) by reaction with condensed molecular oxygen
journal, June 1990
- Gao, Y.; Lusignan, C. P.; Ruckman, M. W.
- Journal of Applied Physics, Vol. 67, Issue 11
The formation of metal–oxygen species at low temperatures
journal, May 1990
- Qiu, S. L.; Lin, C. L.; Chen, Jie
- Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films, Vol. 8, Issue 3