Superconducting microcircuitry by the microlithgraphic patterning of superconducting compounds and related materials
Abstract
Superconducting microcircuits including a thin layer of Ba.sub.2 Cu.sub.3 O.sub.5+x (0<1) on a substrate. A thin layer of a dopant; for example, Y.sub.2 O.sub.3 for superconducting patterns of YBa.sub.2 Cu.sub.3 O.sub.7-x, or Pr.sub.2 O.sub.3 for insulator patterns of PrBa.sub.2 Cu.sub.3 O.sub.7-x. These layers are covered with a layer of photoresist, which is exposed to light through a mask having a pattern for a desired circuit. The photoresist is then developed to reveal a pattern of the thin dopant layer which will be etched away. The microcircuit is then etched and stripped to remove the unneeded portion of the thin dopant layer. Finally, the microcircuit is heated at a temperature and for a period of time sufficient to diffuse and react the dopant layer with the thin layer of Ba.sub.2 Cu.sub.3 O.sub.5+x, forming a pattern of superconductor or insulator.
- Inventors:
-
- Los Alamos, NM
- Issue Date:
- Research Org.:
- Los Alamos National Laboratory (LANL), Los Alamos, NM (United States)
- OSTI Identifier:
- 868896
- Patent Number(s):
- 5238913
- Assignee:
- United States of America as represented by United States (Washington, DC)
- Patent Classifications (CPCs):
-
Y - NEW / CROSS SECTIONAL TECHNOLOGIES Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC Y10S - TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- DOE Contract Number:
- W-7405-ENG-36
- Resource Type:
- Patent
- Country of Publication:
- United States
- Language:
- English
- Subject:
- superconducting; microcircuitry; microlithgraphic; patterning; compounds; related; materials; microcircuits; including; layer; cu; substrate; dopant; example; patterns; yba; 7-x; insulator; prba; layers; covered; photoresist; exposed; light; mask; pattern; desired; circuit; developed; reveal; etched; microcircuit; stripped; remove; unneeded; portion; finally; heated; temperature; period; time; sufficient; diffuse; react; forming; superconductor; related materials; time sufficient; circuits including; superconducting compounds; desired circuit; /505/204/216/
Citation Formats
Coppa, Nicholas V. Superconducting microcircuitry by the microlithgraphic patterning of superconducting compounds and related materials. United States: N. p., 1993.
Web.
Coppa, Nicholas V. Superconducting microcircuitry by the microlithgraphic patterning of superconducting compounds and related materials. United States.
Coppa, Nicholas V. Fri .
"Superconducting microcircuitry by the microlithgraphic patterning of superconducting compounds and related materials". United States. https://www.osti.gov/servlets/purl/868896.
@article{osti_868896,
title = {Superconducting microcircuitry by the microlithgraphic patterning of superconducting compounds and related materials},
author = {Coppa, Nicholas V},
abstractNote = {Superconducting microcircuits including a thin layer of Ba.sub.2 Cu.sub.3 O.sub.5+x (0<1) on a substrate. A thin layer of a dopant; for example, Y.sub.2 O.sub.3 for superconducting patterns of YBa.sub.2 Cu.sub.3 O.sub.7-x, or Pr.sub.2 O.sub.3 for insulator patterns of PrBa.sub.2 Cu.sub.3 O.sub.7-x. These layers are covered with a layer of photoresist, which is exposed to light through a mask having a pattern for a desired circuit. The photoresist is then developed to reveal a pattern of the thin dopant layer which will be etched away. The microcircuit is then etched and stripped to remove the unneeded portion of the thin dopant layer. Finally, the microcircuit is heated at a temperature and for a period of time sufficient to diffuse and react the dopant layer with the thin layer of Ba.sub.2 Cu.sub.3 O.sub.5+x, forming a pattern of superconductor or insulator.},
doi = {},
journal = {},
number = ,
volume = ,
place = {United States},
year = {1993},
month = {1}
}