Virtually distortion-free imaging system for large field, high resolution lithography
Abstract
Virtually distortion free large field high resolution imaging is performed using an imaging system which contains large field distortion or field curvature. A reticle is imaged in one direction through the optical system to form an encoded mask. The encoded mask is then imaged back through the imaging system onto a wafer positioned at the reticle position.
- Inventors:
-
- Modesto, CA
- Livermore, CA
- Issue Date:
- Research Org.:
- Lawrence Livermore National Laboratory (LLNL), Livermore, CA (United States)
- OSTI Identifier:
- 868622
- Patent Number(s):
- 5176970
- Assignee:
- United States of America as represented by United States (Washington, DC)
- Patent Classifications (CPCs):
-
G - PHYSICS G03 - PHOTOGRAPHY G03F - PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES
- DOE Contract Number:
- W-7405-ENG-48
- Resource Type:
- Patent
- Country of Publication:
- United States
- Language:
- English
- Subject:
- virtually; distortion-free; imaging; field; resolution; lithography; distortion; free; performed; contains; curvature; reticle; imaged; direction; optical; form; encoded; mask; wafer; positioned; position; resolution imaging; wafer positioned; resolution lithography; field distortion; distortion free; virtually distortion-free; virtually distortion; field curvature; distortion-free imaging; /430/355/
Citation Formats
Hawryluk, Andrew M, and Ceglio, Natale M. Virtually distortion-free imaging system for large field, high resolution lithography. United States: N. p., 1993.
Web.
Hawryluk, Andrew M, & Ceglio, Natale M. Virtually distortion-free imaging system for large field, high resolution lithography. United States.
Hawryluk, Andrew M, and Ceglio, Natale M. Fri .
"Virtually distortion-free imaging system for large field, high resolution lithography". United States. https://www.osti.gov/servlets/purl/868622.
@article{osti_868622,
title = {Virtually distortion-free imaging system for large field, high resolution lithography},
author = {Hawryluk, Andrew M and Ceglio, Natale M},
abstractNote = {Virtually distortion free large field high resolution imaging is performed using an imaging system which contains large field distortion or field curvature. A reticle is imaged in one direction through the optical system to form an encoded mask. The encoded mask is then imaged back through the imaging system onto a wafer positioned at the reticle position.},
doi = {},
journal = {},
number = ,
volume = ,
place = {United States},
year = {Fri Jan 01 00:00:00 EST 1993},
month = {Fri Jan 01 00:00:00 EST 1993}
}
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