Analysis of radiofrequency discharges in plasma
Abstract
Separation of laser optogalvanic signals in plasma into two components: (1) an ionization rate change component, and (2) a photoacoustic mediated component. This separation of components may be performed even when the two components overlap in time, by measuring time-resolved laser optogalvanic signals in an rf discharge plasma as the rf frequency is varied near the electrical resonance peak of the plasma and associated driving/detecting circuits. A novel spectrometer may be constructed to make these measurements. Such a spectrometer would be useful in better understanding and controlling such processes as plasma etching and plasma deposition.
- Inventors:
-
- Baton Rouge, LA
- Issue Date:
- Research Org.:
- Louisiana State Univ., Baton Rouge, LA
- OSTI Identifier:
- 868417
- Patent Number(s):
- 5135604
- Assignee:
- Board of Supervisors of Louisiana State University and Agricultural and (Baton Rouge, LA)
- Patent Classifications (CPCs):
-
G - PHYSICS G01 - MEASURING G01N - INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
- DOE Contract Number:
- FG05-87ER60503
- Resource Type:
- Patent
- Country of Publication:
- United States
- Language:
- English
- Subject:
- analysis; radiofrequency; discharges; plasma; separation; laser; optogalvanic; signals; components; ionization; rate; change; component; photoacoustic; mediated; performed; overlap; time; measuring; time-resolved; rf; discharge; frequency; varied; near; electrical; resonance; peak; associated; driving; detecting; circuits; novel; spectrometer; constructed; measurements; useful; understanding; controlling; processes; etching; deposition; plasma etching; plasma deposition; discharge plasma; plasma etch; electrical resonance; measuring time; change component; resonance peak; /216/118/156/204/356/
Citation Formats
Kumar, Devendra, and McGlynn, Sean P. Analysis of radiofrequency discharges in plasma. United States: N. p., 1992.
Web.
Kumar, Devendra, & McGlynn, Sean P. Analysis of radiofrequency discharges in plasma. United States.
Kumar, Devendra, and McGlynn, Sean P. Wed .
"Analysis of radiofrequency discharges in plasma". United States. https://www.osti.gov/servlets/purl/868417.
@article{osti_868417,
title = {Analysis of radiofrequency discharges in plasma},
author = {Kumar, Devendra and McGlynn, Sean P},
abstractNote = {Separation of laser optogalvanic signals in plasma into two components: (1) an ionization rate change component, and (2) a photoacoustic mediated component. This separation of components may be performed even when the two components overlap in time, by measuring time-resolved laser optogalvanic signals in an rf discharge plasma as the rf frequency is varied near the electrical resonance peak of the plasma and associated driving/detecting circuits. A novel spectrometer may be constructed to make these measurements. Such a spectrometer would be useful in better understanding and controlling such processes as plasma etching and plasma deposition.},
doi = {},
journal = {},
number = ,
volume = ,
place = {United States},
year = {1992},
month = {1}
}
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Works referenced in this record:
Photoacoustics using radio-frequency laser-optogalvanic detection: a new technique for low-pressure photoacoustic spectroscopy. Magnetic predissociation of the state of I 2
journal, September 1986
- Kumar, D.; Klasinc, L.; Clancy, P. L.
- Canadian Journal of Physics, Vol. 64, Issue 9
Time-resolved study of the laser optogalvanic effect in I2
journal, April 1983
- Haner, David A.; Webster, Christopher R.; Flamant, Pierre H.
- Chemical Physics Letters, Vol. 96, Issue 3
Time‐resolved laser optogalvanic spectroscopy of iodine in a radio frequency discharge
journal, April 1989
- Kumar, D.; Clancy, P. L.; McGlynn, S. P.
- The Journal of Chemical Physics, Vol. 90, Issue 8
Temporal variation of electron density in a laser-perturbed discharge plasma and its relationship to the optogalvanic signal
journal, March 1984
- Uetani, Yasunori; Fujimoto, Takashi
- Optics Communications, Vol. 49, Issue 4