Process for preparation of a seed layer for selective metal deposition
Abstract
Disclosed is a process for selective metal deposition comprising of the steps of: a. formation of an initial surface on a substrate, said initial surface being comprised of at least two layers of which the uppermost is inert, b. exposing the surface to a source of heat in pre-determined places wherein surface activation is desired, and c. deposition of metal on activated portions of said surface.
- Inventors:
-
- Berkeley, CA
- Issue Date:
- Research Org.:
- Lawrence Livermore National Laboratory (LLNL), Livermore, CA (United States)
- OSTI Identifier:
- 868202
- Patent Number(s):
- 5098526
- Assignee:
- United States of America as represented by United States (Washington, DC)
- Patent Classifications (CPCs):
-
C - CHEMISTRY C23 - COATING METALLIC MATERIAL C23C - COATING METALLIC MATERIAL
C - CHEMISTRY C25 - ELECTROLYTIC OR ELECTROPHORETIC PROCESSES C25D - PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS
- DOE Contract Number:
- W-7405-ENG-48
- Resource Type:
- Patent
- Country of Publication:
- United States
- Language:
- English
- Subject:
- process; preparation; seed; layer; selective; metal; deposition; disclosed; comprising; steps; formation; initial; surface; substrate; comprised; layers; uppermost; inert; exposing; source; heat; pre-determined; activation; desired; activated; portions; metal deposition; seed layer; selective metal; metal deposit; initial surface; activated portion; /205/
Citation Formats
Bernhardt, Anthony F. Process for preparation of a seed layer for selective metal deposition. United States: N. p., 1992.
Web.
Bernhardt, Anthony F. Process for preparation of a seed layer for selective metal deposition. United States.
Bernhardt, Anthony F. Wed .
"Process for preparation of a seed layer for selective metal deposition". United States. https://www.osti.gov/servlets/purl/868202.
@article{osti_868202,
title = {Process for preparation of a seed layer for selective metal deposition},
author = {Bernhardt, Anthony F},
abstractNote = {Disclosed is a process for selective metal deposition comprising of the steps of: a. formation of an initial surface on a substrate, said initial surface being comprised of at least two layers of which the uppermost is inert, b. exposing the surface to a source of heat in pre-determined places wherein surface activation is desired, and c. deposition of metal on activated portions of said surface.},
doi = {},
journal = {},
number = ,
volume = ,
place = {United States},
year = {1992},
month = {1}
}
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