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Title: Process for removal of water and silicon mu-oxides from chlorosilanes

Abstract

A scavenger composition having utility for removal of water and silicon mu-oxide impurities from chlorosilanes, such scavenger composition comprising: (a) a support; and (b) associated with the support, one or more compound(s) selected from the group consisting of compounds of the formula: R.sub.a-x MCl.sub.x wherein: M is a metal selected from the group consisting of the monovalent metals lithium, sodium, and potassium; the divalent metals magnesium, strontium, barium, and calcium; and the trivalent metal aluminum; R is alkyl; a is a number equal to the valency of metal M; and x is a number having a value of from 0 to a, inclusive; and wherein said compound(s) of the formula R.sub.a-x MCl.sub.x have been activated for impurity-removal service by a reaction scheme selected from those of the group consisting of: (i) reaction of such compound(s) with hydrogen chloride to form a first reaction product therefrom, followed by reaction of the first reaction product with a chlorosilane of the formula: SiH.sub.4-y Cl.sub.y, wherein y is a number having a value of from 1 to 3, inclusive; and (ii) reaction of such compound(s) with a chlorosilane of the formula: SiH.sub.4-y Cl.sub.y wherein y is a number having a value of 1 tomore » 3, inclusive. A corresponding method of making the scavenger composition, and of purifying a chlorosilane which contains oxygen and silicon mu-oxide impurities, likewise are disclosed, together with a purifier apparatus, in which a bed of the scavenger composition is disposed. The composition, purification process, and purifier apparatus of the invention have utility in purifying gaseous chlorosilanes which are employed in the semiconductor industry as silicon source reagents for forming epitaxial silicon layers.« less

Inventors:
 [1];  [2]
  1. (New Milford, CT)
  2. (Danbury, CT)
Issue Date:
Research Org.:
ADVANCED TECHNOLOGY MATERIALS
OSTI Identifier:
868186
Patent Number(s):
5094830
Application Number:
07/737,181
Assignee:
Novapure Corporation (Danbury, CT) OSTI
DOE Contract Number:  
AC01-87ER80469
Resource Type:
Patent
Country of Publication:
United States
Language:
English
Subject:
process; removal; water; silicon; mu-oxides; chlorosilanes; scavenger; composition; utility; mu-oxide; impurities; comprising; support; associated; compound; selected; consisting; compounds; formula; a-x; mcl; metal; monovalent; metals; lithium; sodium; potassium; divalent; magnesium; strontium; barium; calcium; trivalent; aluminum; alkyl; equal; valency; value; inclusive; activated; impurity-removal; service; reaction; scheme; hydrogen; chloride; form; product; therefrom; followed; chlorosilane; sih; 4-y; ii; corresponding; method; purifying; contains; oxygen; likewise; disclosed; purifier; apparatus; bed; disposed; purification; gaseous; employed; semiconductor; industry; source; reagents; forming; epitaxial; layers; trivalent metal; silicon source; monovalent metals; silicon layer; composition comprising; reaction product; hydrogen chloride; metal selected; scavenger composition; reaction scheme; purification process; silicon layers; metal aluminum; oxide impurities; mu-oxide impurities; silicon mu-oxide; divalent metals; product therefrom; silicon mu-oxides; epitaxial silicon; contains oxygen; corresponding method; forming epitaxial; divalent metal; /423/95/252/502/

Citation Formats

Tom, Glenn M., and McManus, James V. Process for removal of water and silicon mu-oxides from chlorosilanes. United States: N. p., 1992. Web.
Tom, Glenn M., & McManus, James V. Process for removal of water and silicon mu-oxides from chlorosilanes. United States.
Tom, Glenn M., and McManus, James V. Tue . "Process for removal of water and silicon mu-oxides from chlorosilanes". United States. https://www.osti.gov/servlets/purl/868186.
@article{osti_868186,
title = {Process for removal of water and silicon mu-oxides from chlorosilanes},
author = {Tom, Glenn M. and McManus, James V.},
abstractNote = {A scavenger composition having utility for removal of water and silicon mu-oxide impurities from chlorosilanes, such scavenger composition comprising: (a) a support; and (b) associated with the support, one or more compound(s) selected from the group consisting of compounds of the formula: R.sub.a-x MCl.sub.x wherein: M is a metal selected from the group consisting of the monovalent metals lithium, sodium, and potassium; the divalent metals magnesium, strontium, barium, and calcium; and the trivalent metal aluminum; R is alkyl; a is a number equal to the valency of metal M; and x is a number having a value of from 0 to a, inclusive; and wherein said compound(s) of the formula R.sub.a-x MCl.sub.x have been activated for impurity-removal service by a reaction scheme selected from those of the group consisting of: (i) reaction of such compound(s) with hydrogen chloride to form a first reaction product therefrom, followed by reaction of the first reaction product with a chlorosilane of the formula: SiH.sub.4-y Cl.sub.y, wherein y is a number having a value of from 1 to 3, inclusive; and (ii) reaction of such compound(s) with a chlorosilane of the formula: SiH.sub.4-y Cl.sub.y wherein y is a number having a value of 1 to 3, inclusive. A corresponding method of making the scavenger composition, and of purifying a chlorosilane which contains oxygen and silicon mu-oxide impurities, likewise are disclosed, together with a purifier apparatus, in which a bed of the scavenger composition is disposed. The composition, purification process, and purifier apparatus of the invention have utility in purifying gaseous chlorosilanes which are employed in the semiconductor industry as silicon source reagents for forming epitaxial silicon layers.},
doi = {},
journal = {},
number = ,
volume = ,
place = {United States},
year = {1992},
month = {3}
}

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