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Title: Background-reducing X-ray multilayer mirror

Abstract

Background-reducing x-ray multilayer mirror. A multiple-layer "wavetrap" deposited over the surface of a layered, synthetic-microstructure soft x-ray mirror optimized for reflectivity at chosen wavelengths is disclosed for reducing the reflectivity of undesired, longer wavelength incident radiation incident thereon. In three separate mirror designs employing an alternating molybdenum and silicon layered, mirrored structure overlaid by two layers of a molybdenum/silicon pair anti-reflection coating, reflectivities of near normal incidence 133, 171, and 186 .ANG. wavelengths have been optimized, while that at 304 .ANG. has been minimized. The optimization process involves the choice of materials, the composition of the layer/pairs as well as the number thereof, and the distance therebetween for the mirror, and the simultaneous choice of materials, the composition of the layer/pairs, and their number and distance for the "wavetrap."

Inventors:
 [1];  [1];  [1]
  1. Los Alamos, NM
Issue Date:
Research Org.:
Los Alamos National Laboratory (LANL), Los Alamos, NM (United States)
OSTI Identifier:
868164
Patent Number(s):
5086443
Assignee:
United States of America as represented by United States (Washington, DC)
Patent Classifications (CPCs):
B - PERFORMING OPERATIONS B82 - NANOTECHNOLOGY B82Y - SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES
G - PHYSICS G21 - NUCLEAR PHYSICS G21K - TECHNIQUES FOR HANDLING PARTICLES OR IONISING RADIATION NOT OTHERWISE PROVIDED FOR
Resource Type:
Patent
Country of Publication:
United States
Language:
English
Subject:
background-reducing; x-ray; multilayer; mirror; multiple-layer; wavetrap; deposited; surface; layered; synthetic-microstructure; soft; optimized; reflectivity; chosen; wavelengths; disclosed; reducing; undesired; wavelength; incident; radiation; thereon; separate; designs; employing; alternating; molybdenum; silicon; mirrored; structure; overlaid; layers; pair; anti-reflection; coating; reflectivities; near; normal; incidence; 133; 171; 186; ang; 304; minimized; optimization; process; involves; choice; materials; composition; layer; pairs; distance; therebetween; simultaneous; normal incidence; incident radiation; process involves; silicon layer; soft x-ray; radiation incident; x-ray multilayer; anti-reflection coating; near normal; multilayer mirror; chosen wavelength; x-ray mirror; incident thereon; silicon layered; background-reducing x-ray; /378/

Citation Formats

Bloch, Jeffrey J, Roussel-Dupre', Diane, and Smith, Barham W. Background-reducing X-ray multilayer mirror. United States: N. p., 1992. Web.
Bloch, Jeffrey J, Roussel-Dupre', Diane, & Smith, Barham W. Background-reducing X-ray multilayer mirror. United States.
Bloch, Jeffrey J, Roussel-Dupre', Diane, and Smith, Barham W. Wed . "Background-reducing X-ray multilayer mirror". United States. https://www.osti.gov/servlets/purl/868164.
@article{osti_868164,
title = {Background-reducing X-ray multilayer mirror},
author = {Bloch, Jeffrey J and Roussel-Dupre', Diane and Smith, Barham W},
abstractNote = {Background-reducing x-ray multilayer mirror. A multiple-layer "wavetrap" deposited over the surface of a layered, synthetic-microstructure soft x-ray mirror optimized for reflectivity at chosen wavelengths is disclosed for reducing the reflectivity of undesired, longer wavelength incident radiation incident thereon. In three separate mirror designs employing an alternating molybdenum and silicon layered, mirrored structure overlaid by two layers of a molybdenum/silicon pair anti-reflection coating, reflectivities of near normal incidence 133, 171, and 186 .ANG. wavelengths have been optimized, while that at 304 .ANG. has been minimized. The optimization process involves the choice of materials, the composition of the layer/pairs as well as the number thereof, and the distance therebetween for the mirror, and the simultaneous choice of materials, the composition of the layer/pairs, and their number and distance for the "wavetrap."},
doi = {},
journal = {},
number = ,
volume = ,
place = {United States},
year = {Wed Jan 01 00:00:00 EST 1992},
month = {Wed Jan 01 00:00:00 EST 1992}
}

Works referenced in this record:

Reflection / Suppression Coatings For 900 - 1200 A Radiation
conference, July 1989


Metal multilayer mirrors for EUV/ultrasoft x-ray wide-field telescopes
journal, January 1990


Layered Synthetic Microstructures: Properties And Applications In X-Ray Astronomy
conference, August 1979