Selective protection of poly(tetra-fluoroethylene) from effects of chemical etching
Abstract
A photolithographic method for treating an article formed of polymeric material comprises subjecting portions of a surface of the polymeric article to ionizing radiation; and then subjecting the surface to chemical etching. The ionizing radiation treatment according to the present invention minimizes the effect of the subseuent chemical etching treatment. Thus, selective protection from the effects of chemical etching can be easily provided. The present invention has particular applicability to articles formed of fluorocarbons, such as PTFE. The ionizing radiation employed in the method may comprise Mg(k.alpha.) X-rays or lower-energy electrons.
- Inventors:
-
- Albuquerque, NM
- Issue Date:
- Research Org.:
- AT&T
- OSTI Identifier:
- 868069
- Patent Number(s):
- 5066565
- Assignee:
- United States of America as represented by United States (Washington, DC)
- Patent Classifications (CPCs):
-
G - PHYSICS G03 - PHOTOGRAPHY G03F - PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES
H - ELECTRICITY H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR H05K - PRINTED CIRCUITS
- DOE Contract Number:
- AC04-76DP00789
- Resource Type:
- Patent
- Country of Publication:
- United States
- Language:
- English
- Subject:
- selective; protection; poly; tetra-fluoroethylene; effects; chemical; etching; photolithographic; method; treating; article; formed; polymeric; material; comprises; subjecting; portions; surface; ionizing; radiation; treatment; according; minimizes; effect; subseuent; easily; provided; particular; applicability; articles; fluorocarbons; ptfe; employed; comprise; mg; alpha; x-rays; lower-energy; electrons; energy electrons; chemical etching; polymeric material; ionizing radiation; material comprises; energy electron; polymeric article; articles formed; comprises subjecting; /430/216/
Citation Formats
Martinez, Robert J, and Rye, Robert R. Selective protection of poly(tetra-fluoroethylene) from effects of chemical etching. United States: N. p., 1991.
Web.
Martinez, Robert J, & Rye, Robert R. Selective protection of poly(tetra-fluoroethylene) from effects of chemical etching. United States.
Martinez, Robert J, and Rye, Robert R. Tue .
"Selective protection of poly(tetra-fluoroethylene) from effects of chemical etching". United States. https://www.osti.gov/servlets/purl/868069.
@article{osti_868069,
title = {Selective protection of poly(tetra-fluoroethylene) from effects of chemical etching},
author = {Martinez, Robert J and Rye, Robert R},
abstractNote = {A photolithographic method for treating an article formed of polymeric material comprises subjecting portions of a surface of the polymeric article to ionizing radiation; and then subjecting the surface to chemical etching. The ionizing radiation treatment according to the present invention minimizes the effect of the subseuent chemical etching treatment. Thus, selective protection from the effects of chemical etching can be easily provided. The present invention has particular applicability to articles formed of fluorocarbons, such as PTFE. The ionizing radiation employed in the method may comprise Mg(k.alpha.) X-rays or lower-energy electrons.},
doi = {},
journal = {},
number = ,
volume = ,
place = {United States},
year = {1991},
month = {1}
}