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Title: High intensity x-ray source using liquid gallium target

Abstract

A high intensity x-ray source that uses a flowing stream of liquid gallium as a target with the electron beam impinging directly on the liquid metal.

Inventors:
 [1];  [2];  [3];  [4]
  1. (Hinsdale, IL)
  2. (Cupertino, CA)
  3. (Chicago, IL)
  4. (Westmont, IL)
Issue Date:
Research Org.:
Argonne National Laboratory (ANL), Argonne, IL
OSTI Identifier:
867513
Patent Number(s):
4953191
Assignee:
United States of America as represented by United States (Washington, DC) ANL
DOE Contract Number:  
W-31109-ENG-38
Resource Type:
Patent
Country of Publication:
United States
Language:
English
Subject:
intensity; x-ray; source; liquid; gallium; target; flowing; stream; electron; beam; impinging; directly; metal; x-ray source; liquid metal; electron beam; flowing stream; beam impinging; intensity x-ray; liquid gallium; /378/

Citation Formats

Smither, Robert K., Knapp, Gordon S., Westbrook, Edwin M., and Forster, George A. High intensity x-ray source using liquid gallium target. United States: N. p., 1990. Web.
Smither, Robert K., Knapp, Gordon S., Westbrook, Edwin M., & Forster, George A. High intensity x-ray source using liquid gallium target. United States.
Smither, Robert K., Knapp, Gordon S., Westbrook, Edwin M., and Forster, George A. Mon . "High intensity x-ray source using liquid gallium target". United States. https://www.osti.gov/servlets/purl/867513.
@article{osti_867513,
title = {High intensity x-ray source using liquid gallium target},
author = {Smither, Robert K. and Knapp, Gordon S. and Westbrook, Edwin M. and Forster, George A.},
abstractNote = {A high intensity x-ray source that uses a flowing stream of liquid gallium as a target with the electron beam impinging directly on the liquid metal.},
doi = {},
journal = {},
number = ,
volume = ,
place = {United States},
year = {1990},
month = {1}
}

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