skip to main content
DOE Patents title logo U.S. Department of Energy
Office of Scientific and Technical Information

Title: Multilayer optical dielectric coating

Abstract

A highly damage resistant, multilayer, optical reflective coating includes alternating layers of doped and undoped dielectric material. The doping levels are low enough that there are no distinct interfaces between the doped and undoped layers so that the coating has properties nearly identical to the undoped material. The coating is fabricated at high temperature with plasma-assisted chemical vapor deposition techniques to eliminate defects, reduce energy-absorption sites, and maintain proper chemical stoichiometry. A number of differently-doped layer pairs, each layer having a thickness equal to one-quarter of a predetermined wavelength in the material are combined to form a narrowband reflective coating for a predetermined wavelength. Broadband reflectors are made by using a number of narrowband reflectors, each covering a portion of the broadband.

Inventors:
 [1]
  1. (Pleasanton, CA)
Issue Date:
Research Org.:
Lawrence Livermore National Lab. (LLNL), Livermore, CA (United States)
OSTI Identifier:
867373
Patent Number(s):
4925259
Assignee:
United States of America as represented by United States (Washington, DC) LLNL
DOE Contract Number:  
W-7405-ENG-48
Resource Type:
Patent
Country of Publication:
United States
Language:
English
Subject:
multilayer; optical; dielectric; coating; highly; damage; resistant; reflective; alternating; layers; doped; undoped; material; doping; levels; distinct; interfaces; properties; nearly; identical; fabricated; temperature; plasma-assisted; chemical; vapor; deposition; techniques; eliminate; defects; reduce; energy-absorption; sites; maintain; proper; stoichiometry; differently-doped; layer; pairs; thickness; equal; one-quarter; predetermined; wavelength; combined; form; narrowband; broadband; reflectors; covering; portion; assisted chemical; reflective coating; predetermined wavelength; alternating layers; chemical vapor; vapor deposition; dielectric material; deposition techniques; doped layer; nearly identical; deposition technique; doped layers; layer pairs; optical reflective; optical dielectric; maintain proper; undoped layer; dielectric coating; doping levels; /359/

Citation Formats

Emmett, John L. Multilayer optical dielectric coating. United States: N. p., 1990. Web.
Emmett, John L. Multilayer optical dielectric coating. United States.
Emmett, John L. Mon . "Multilayer optical dielectric coating". United States. https://www.osti.gov/servlets/purl/867373.
@article{osti_867373,
title = {Multilayer optical dielectric coating},
author = {Emmett, John L.},
abstractNote = {A highly damage resistant, multilayer, optical reflective coating includes alternating layers of doped and undoped dielectric material. The doping levels are low enough that there are no distinct interfaces between the doped and undoped layers so that the coating has properties nearly identical to the undoped material. The coating is fabricated at high temperature with plasma-assisted chemical vapor deposition techniques to eliminate defects, reduce energy-absorption sites, and maintain proper chemical stoichiometry. A number of differently-doped layer pairs, each layer having a thickness equal to one-quarter of a predetermined wavelength in the material are combined to form a narrowband reflective coating for a predetermined wavelength. Broadband reflectors are made by using a number of narrowband reflectors, each covering a portion of the broadband.},
doi = {},
journal = {},
number = ,
volume = ,
place = {United States},
year = {1990},
month = {1}
}

Patent:

Save / Share: