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Title: Extreme ultraviolet reflector

Abstract

A multi-faceted mirror forms a retroreflector for a resonator loop in a free electron laser (FEL) operating in the XUV (.lambda.=10-100 nm). The number of facets is determined by the angle-of-incidence needed to obtain total external reflectance (TER) from the facet surface and the angle through which the FEL beam is to be turned. Angles-of-incidence greater than the angle for TER may be used to increase the area of the beam incident on the surface and reduce energy absorption density. Suitable surface films having TER in the 10-100 nm range may be formed from a variety of materials, including Al, single-crystal Si, Ag, and Rh. One of the facets is formed as an off-axis conic section to collimate the output beam with minimum astigmatism.

Inventors:
 [1]
  1. Los Alamos, NM
Issue Date:
Research Org.:
Los Alamos National Lab. (LANL), Los Alamos, NM (United States)
OSTI Identifier:
867338
Patent Number(s):
4917447
Assignee:
United States of America as represented by Department of Energy (Washington, DC)
Patent Classifications (CPCs):
G - PHYSICS G02 - OPTICS G02B - OPTICAL ELEMENTS, SYSTEMS, OR APPARATUS
DOE Contract Number:  
W-7405-ENG-36
Resource Type:
Patent
Country of Publication:
United States
Language:
English
Subject:
extreme; ultraviolet; reflector; multi-faceted; mirror; forms; retroreflector; resonator; loop; free; electron; laser; operating; xuv; lambda; 10-100; nm; facets; determined; angle-of-incidence; obtain; total; external; reflectance; facet; surface; angle; beam; angles-of-incidence; increase; incident; reduce; energy; absorption; density; suitable; films; range; formed; variety; materials; including; single-crystal; off-axis; conic; section; collimate; output; minimum; astigmatism; surface film; energy absorption; output beam; electron laser; extreme ultraviolet; free electron; beam incident; nm range; mirror forms; table surface; /359/250/372/

Citation Formats

Newnam, Brian E. Extreme ultraviolet reflector. United States: N. p., 1990. Web.
Newnam, Brian E. Extreme ultraviolet reflector. United States.
Newnam, Brian E. Mon . "Extreme ultraviolet reflector". United States. https://www.osti.gov/servlets/purl/867338.
@article{osti_867338,
title = {Extreme ultraviolet reflector},
author = {Newnam, Brian E},
abstractNote = {A multi-faceted mirror forms a retroreflector for a resonator loop in a free electron laser (FEL) operating in the XUV (.lambda.=10-100 nm). The number of facets is determined by the angle-of-incidence needed to obtain total external reflectance (TER) from the facet surface and the angle through which the FEL beam is to be turned. Angles-of-incidence greater than the angle for TER may be used to increase the area of the beam incident on the surface and reduce energy absorption density. Suitable surface films having TER in the 10-100 nm range may be formed from a variety of materials, including Al, single-crystal Si, Ag, and Rh. One of the facets is formed as an off-axis conic section to collimate the output beam with minimum astigmatism.},
doi = {},
journal = {},
number = ,
volume = ,
place = {United States},
year = {1990},
month = {1}
}