skip to main content
DOE Patents title logo U.S. Department of Energy
Office of Scientific and Technical Information

Title: Process for levelling film surfaces and products thereof

Abstract

Semiconductor films and photovoltaic devices prepared therefrom are provided wherein the semiconductor films have a specular surface with a texture less than about 0.25 micron greater than the average planar film surface and wherein the semiconductor films are surface modified by exposing the surface to an aqueous solution of bromine containing an acid or salt and continuing such exposure for a time sufficient to etch the surface.

Inventors:
 [1];  [1]
  1. (Newark, DE)
Issue Date:
Research Org.:
Midwest Research Institute
OSTI Identifier:
867308
Patent Number(s):
4909863
Application Number:
07/218,758
Assignee:
University of Delaware (Newark, DE) NREL
DOE Contract Number:  
AC02-83CH10093; XL-7-06031-5
Resource Type:
Patent
Country of Publication:
United States
Language:
English
Subject:
process; levelling; film; surfaces; products; semiconductor; films; photovoltaic; devices; prepared; therefrom; provided; specular; surface; texture; 25; micron; average; planar; modified; exposing; aqueous; solution; bromine; containing; acid; salt; continuing; exposure; time; sufficient; etch; semiconductor film; photovoltaic devices; time sufficient; aqueous solution; photovoltaic device; semiconductor films; surface modified; film surface; specular surface; prepared therefrom; /148/136/216/438/

Citation Formats

Birkmire, Robert W., and McCandless, Brian E. Process for levelling film surfaces and products thereof. United States: N. p., 1990. Web.
Birkmire, Robert W., & McCandless, Brian E. Process for levelling film surfaces and products thereof. United States.
Birkmire, Robert W., and McCandless, Brian E. Tue . "Process for levelling film surfaces and products thereof". United States. https://www.osti.gov/servlets/purl/867308.
@article{osti_867308,
title = {Process for levelling film surfaces and products thereof},
author = {Birkmire, Robert W. and McCandless, Brian E.},
abstractNote = {Semiconductor films and photovoltaic devices prepared therefrom are provided wherein the semiconductor films have a specular surface with a texture less than about 0.25 micron greater than the average planar film surface and wherein the semiconductor films are surface modified by exposing the surface to an aqueous solution of bromine containing an acid or salt and continuing such exposure for a time sufficient to etch the surface.},
doi = {},
journal = {},
number = ,
volume = ,
place = {United States},
year = {1990},
month = {3}
}

Patent:

Save / Share: