Method of processing materials using an inductively coupled plasma

Hull, Donald E; Bieniewski, Thomas M

Title: Method of processing materials using an inductively coupled plasma

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Abstract

A method for making fine power using an inductively coupled plasma. The method provides a gas-free environment, since the plasma is formed without using a gas. The starting material used in the method is in solid form.

Inventors:

Hull, Donald E ^[1]; Bieniewski, Thomas M ^[1]

Los Alamos, NM

Issue Date:: 1990-01-01

Research Org.:: Los Alamos National Lab. (LANL), Los Alamos, NM (United States)

OSTI Identifier:: 867259

Patent Number(s):: 4897579

Assignee:: United States of America as represented by United States (Washington, DC)

Patent Classifications (CPCs):: C - CHEMISTRY C23 - COATING METALLIC MATERIAL C23C - COATING METALLIC MATERIAL

H - ELECTRICITY H01 - BASIC ELECTRIC ELEMENTS H01J - ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS

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C - CHEMISTRY C23 - COATING METALLIC MATERIAL C23C - COATING METALLIC MATERIAL
C23C14/48 - Ion implantation

H - ELECTRICITY H01 - BASIC ELECTRIC ELEMENTS H01J - ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
H01J37/321 - {the radio frequency energy being inductively coupled to the plasma}

C - CHEMISTRY C23 - COATING METALLIC MATERIAL C23C - COATING METALLIC MATERIAL
C23C14/32 - by explosion

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DOE Contract Number:: W-7405-ENG-36

Resource Type:: Patent

Country of Publication:: United States

Language:: English

Subject:: method; processing; materials; inductively; coupled; plasma; fine; power; provides; gas-free; environment; formed; gas; starting; material; solid; form; solid form; starting material; inductively coupled; coupled plasma; method provides; method provide; processing materials; gas-free environment; /315/219/313/

Citation Formats


                    Hull, Donald E, and Bieniewski, Thomas M. Method of processing materials using an inductively coupled plasma.  United States: N. p., 1990. 
        Web.

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                    Hull, Donald E, & Bieniewski, Thomas M. Method of processing materials using an inductively coupled plasma.  United States.

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                    Hull, Donald E, and Bieniewski, Thomas M. Mon .  
        "Method of processing materials using an inductively coupled plasma".  United States.  https://www.osti.gov/servlets/purl/867259.

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@article{osti_867259,

  title        = {Method of processing materials using an inductively coupled plasma},

  author       = {Hull, Donald E and Bieniewski, Thomas M},

  abstractNote = {A method for making fine power using an inductively coupled plasma. The method provides a gas-free environment, since the plasma is formed without using a gas. The starting material used in the method is in solid form.},

  doi          = {},

  journal      = {},
number       = ,

  volume       = ,

  place        = {United States},

  year         = {1990},

  month        = {1}

}

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