Thin film coating process using an inductively coupled plasma
Abstract
Thin coatings of normally solid materials are applied to target substrates using an inductively coupled plasma. Particles of the coating material are vaporized by plasma heating, and pass through an orifice to a first vacuum zone in which the particles are accelerated to a velocity greater than Mach 1. The shock wave generated in the first vacuum zone is intercepted by the tip of a skimmer cone that provides a second orifice. The particles pass through the second orifice into a second zone maintained at a higher vacuum and impinge on the target to form the coating. Ultrapure coatings can be formed.
- Inventors:
-
- Ames, IA
- Issue Date:
- Research Org.:
- Ames Laboratory (AMES), Ames, IA; Iowa State Univ., Ames, IA (United States)
- OSTI Identifier:
- 867256
- Patent Number(s):
- 4897282
- Application Number:
- 07/199,286
- Assignee:
- Iowa State University Reserach Foundation, Inc. (Ames, IA)
- Patent Classifications (CPCs):
-
C - CHEMISTRY C23 - COATING METALLIC MATERIAL C23C - COATING METALLIC MATERIAL
- DOE Contract Number:
- W-7405-ENG-82
- Resource Type:
- Patent
- Country of Publication:
- United States
- Language:
- English
- Subject:
- film; coating; process; inductively; coupled; plasma; coatings; normally; solid; materials; applied; target; substrates; particles; material; vaporized; heating; pass; orifice; vacuum; zone; accelerated; velocity; mach; shock; wave; generated; intercepted; tip; skimmer; cone; provides; maintained; impinge; form; ultrapure; formed; zone maintained; coating material; solid materials; inductively coupled; shock wave; solid material; coupled plasma; film coating; target substrate; normally solid; coating process; particles pass; plasma heating; wave generated; target substrates; /427/250/
Citation Formats
Kniseley, Richard N, Schmidt, Frederick A, and Merkle, Brian D. Thin film coating process using an inductively coupled plasma. United States: N. p., 1990.
Web.
Kniseley, Richard N, Schmidt, Frederick A, & Merkle, Brian D. Thin film coating process using an inductively coupled plasma. United States.
Kniseley, Richard N, Schmidt, Frederick A, and Merkle, Brian D. Tue .
"Thin film coating process using an inductively coupled plasma". United States. https://www.osti.gov/servlets/purl/867256.
@article{osti_867256,
title = {Thin film coating process using an inductively coupled plasma},
author = {Kniseley, Richard N and Schmidt, Frederick A and Merkle, Brian D},
abstractNote = {Thin coatings of normally solid materials are applied to target substrates using an inductively coupled plasma. Particles of the coating material are vaporized by plasma heating, and pass through an orifice to a first vacuum zone in which the particles are accelerated to a velocity greater than Mach 1. The shock wave generated in the first vacuum zone is intercepted by the tip of a skimmer cone that provides a second orifice. The particles pass through the second orifice into a second zone maintained at a higher vacuum and impinge on the target to form the coating. Ultrapure coatings can be formed.},
doi = {},
journal = {},
number = ,
volume = ,
place = {United States},
year = {Tue Jan 30 00:00:00 EST 1990},
month = {Tue Jan 30 00:00:00 EST 1990}
}
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