Apparatus and method for enhanced chemical processing in high pressure and atmospheric plasmas produced by high frequency electromagnetic waves

Efthimion, Philip C; Helfritch, Dennis J

Title: Apparatus and method for enhanced chemical processing in high pressure and atmospheric plasmas produced by high frequency electromagnetic waves

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Abstract

An apparatus and method for creating high temperature plasmas for enhanced chemical processing of gaseous fluids, toxic chemicals, and the like, at a wide range of pressures, especially at atmospheric and high pressures includes an electro-magnetic resonator cavity, preferably a reentrant cavity, and a wave guiding structure which connects an electro-magnetic source to the cavity. The cavity includes an intake port and an exhaust port, each having apertures in the conductive walls of the cavity sufficient for the intake of the gaseous fluids and for the discharge of the processed gaseous fluids. The apertures are sufficiently small to prevent the leakage of the electro-magnetic radiation from the cavity. Gaseous fluid flowing from the direction of the electro-magnetic source through the guiding wave structure and into the cavity acts on the plasma to push it away from the guiding wave structure and the electro-magnetic source. The gaseous fluid flow confines the high temperature plasma inside the cavity and allows complete chemical processing of the gaseous fluids at a wide range of pressures.

Inventors:

Efthimion, Philip C ^[1]; Helfritch, Dennis J ^[2]

Bedminister, NJ
Flemington, NJ

Issue Date:: 1989-11-28

Research Org.:: COTTRELL ENVIRONMENTAL SCIENCE

OSTI Identifier:: 867193

Patent Number(s):: 4883570

Application Number:: 4883570

Assignee:: Research-Cottrell, Inc. (Somerville, NJ)

Patent Classifications (CPCs):: B - PERFORMING OPERATIONS B01 - PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL B01J - CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY

H - ELECTRICITY H01 - BASIC ELECTRIC ELEMENTS H01J - ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS

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B - PERFORMING OPERATIONS B01 - PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL B01J - CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY
B01J19/126 - {Microwaves}

H - ELECTRICITY H01 - BASIC ELECTRIC ELEMENTS H01J - ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
H01J37/32192 - {Microwave generated discharge

B - PERFORMING OPERATIONS B01 - PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL B01J - CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY
B01J2219/0894 - Processes carried out in the presence of a plasma

H - ELECTRICITY H01 - BASIC ELECTRIC ELEMENTS H01J - ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
H01J2237/338 - Changing chemical properties of treated surfaces

H - ELECTRICITY H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR H05H - PLASMA TECHNIQUE
H05H1/46 - using applied electromagnetic fields, e.g. high frequency or microwave energy

B - PERFORMING OPERATIONS B01 - PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL B01D - SEPARATION
B01D53/34 - Chemical or biological purification of waste gases

B - PERFORMING OPERATIONS B01 - PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL B01J - CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY
B01J19/123 - {Ultra-violet light}

B - PERFORMING OPERATIONS B01 - PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL B01D - SEPARATION
B01D53/60 - Simultaneously removing sulfur oxides and nitrogen oxides
B01D53/32 - by electrical effects other than those provided for in group B01D61/00
B01D53/70 - Organic halogen compounds

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DOE Contract Number:: AC22-85PC81002

Resource Type:: Patent

Country of Publication:: United States

Language:: English

Subject:: apparatus; method; enhanced; chemical; processing; pressure; atmospheric; plasmas; produced; frequency; electromagnetic; waves; creating; temperature; gaseous; fluids; toxic; chemicals; wide; range; pressures; especially; electro-magnetic; resonator; cavity; preferably; reentrant; wave; guiding; structure; connects; source; intake; exhaust; apertures; conductive; walls; sufficient; discharge; processed; sufficiently; prevent; leakage; radiation; fluid; flowing; direction; plasma; push; flow; confines; inside; allows; complete; wave structure; enhanced chemical; magnetic wave; gaseous fluid; fluid flow; wide range; electromagnetic waves; electromagnetic wave; fluid flowing; chemical processing; toxic chemicals; chemical process; resonator cavity; temperature plasma; frequency electromagnetic; conductive walls; temperature plasmas; toxic chemical; /204/219/315/422/

Citation Formats


                    Efthimion, Philip C, and Helfritch, Dennis J. Apparatus and method for enhanced chemical processing in high pressure and atmospheric plasmas produced by high frequency electromagnetic waves.  United States: N. p., 1989. 
        Web.

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                    Efthimion, Philip C, & Helfritch, Dennis J. Apparatus and method for enhanced chemical processing in high pressure and atmospheric plasmas produced by high frequency electromagnetic waves.  United States.

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                    Efthimion, Philip C, and Helfritch, Dennis J. Tue .  
        "Apparatus and method for enhanced chemical processing in high pressure and atmospheric plasmas produced by high frequency electromagnetic waves".  United States.  https://www.osti.gov/servlets/purl/867193.

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@article{osti_867193,

  title        = {Apparatus and method for enhanced chemical processing in high pressure and atmospheric plasmas produced by high frequency electromagnetic waves},

  author       = {Efthimion, Philip C and Helfritch, Dennis J},

  abstractNote = {An apparatus and method for creating high temperature plasmas for enhanced chemical processing of gaseous fluids, toxic chemicals, and the like, at a wide range of pressures, especially at atmospheric and high pressures includes an electro-magnetic resonator cavity, preferably a reentrant cavity, and a wave guiding structure which connects an electro-magnetic source to the cavity. The cavity includes an intake port and an exhaust port, each having apertures in the conductive walls of the cavity sufficient for the intake of the gaseous fluids and for the discharge of the processed gaseous fluids. The apertures are sufficiently small to prevent the leakage of the electro-magnetic radiation from the cavity. Gaseous fluid flowing from the direction of the electro-magnetic source through the guiding wave structure and into the cavity acts on the plasma to push it away from the guiding wave structure and the electro-magnetic source. The gaseous fluid flow confines the high temperature plasma inside the cavity and allows complete chemical processing of the gaseous fluids at a wide range of pressures.},

  doi          = {},

  journal      = {},
number       = ,

  volume       = ,

  place        = {United States},

  year         = {1989},

  month        = {11}

}

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