Magnetron with flux switching cathode and method of operation

Title: Magnetron with flux switching cathode and method of operation

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Abstract

A magnetron sputtering apparatus is formed with a plurality of cells each for generating an independent magnetic field within a different region in the chamber of the apparatus. Each magnetic field aids in maintaining an ion plasma in the respective region of the chamber. One of a plurality of sputtering material targets is positioned on an electrode adjacent to each region so that said ions strike the target ejecting some of the target material. By selectively generating each magnetic field, the ion plasma may be moved from region to region to sputter material from different targets. The sputtered material becomes deposited on a substrate mounted on another electrode within the chamber. The duty cycle of each cell can be dynamically varied during the deposition to produce a layer having a graded composition throughout its thickness.

Inventors:

Aaron, David B. ^[1]; Wiley, John D. ^[2]

(University City, MO)
(Madison, WI)

Issue Date:: 1989-01-01

Research Org.:: University of Wisconsin

OSTI Identifier:: 867103

Patent Number(s):: 4865710

Assignee:: Wisconsin Alumni Research Foundation (Madison, WI) CHO

DOE Contract Number:: FG02-84ER45096

Resource Type:: Patent

Country of Publication:: United States

Language:: English

Subject:: magnetron; flux; switching; cathode; method; operation; sputtering; apparatus; formed; plurality; cells; generating; independent; magnetic; field; region; chamber; aids; maintaining; plasma; respective; material; targets; positioned; electrode; adjacent; strike; target; ejecting; selectively; moved; sputter; sputtered; deposited; substrate; mounted; duty; cycle; cell; dynamically; varied; deposition; produce; layer; graded; composition; throughout; thickness; magnetron sputter; magnetron sputtering; magnetic field; duty cycle; target material; sputtering apparatus; graded composition; dynamically varied; independent magnetic; target mater; /204/

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                    Aaron, David B., and Wiley, John D. Magnetron with flux switching cathode and method of operation.  United States: N. p., 1989. 
        Web.

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                    Aaron, David B., & Wiley, John D. Magnetron with flux switching cathode and method of operation.  United States.

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                    Aaron, David B., and Wiley, John D. Sun .  
        "Magnetron with flux switching cathode and method of operation".  United States.  https://www.osti.gov/servlets/purl/867103.

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@article{osti_867103,

  title        = {Magnetron with flux switching cathode and method of operation},

  author       = {Aaron, David B. and Wiley, John D.},

  abstractNote = {A magnetron sputtering apparatus is formed with a plurality of cells each for generating an independent magnetic field within a different region in the chamber of the apparatus. Each magnetic field aids in maintaining an ion plasma in the respective region of the chamber. One of a plurality of sputtering material targets is positioned on an electrode adjacent to each region so that said ions strike the target ejecting some of the target material. By selectively generating each magnetic field, the ion plasma may be moved from region to region to sputter material from different targets. The sputtered material becomes deposited on a substrate mounted on another electrode within the chamber. The duty cycle of each cell can be dynamically varied during the deposition to produce a layer having a graded composition throughout its thickness.},

  doi          = {},

  journal      = {},
number       = ,

  volume       = ,

  place        = {United States},

  year         = {1989},

  month        = {1}

}

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