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Title: Modification of polymeric surface for improved adhesion via electron beam exposure

Abstract

Treating polymer surfaces, e.g., Teflon, particularly very thin surfaces, e.g., 50-10,000 .ANG. with low energy electron radiation, e.g., 100-1000 eV, in a high vacuum environment, e.g., less than 10.sup.-6 Torr, to enhance the ability of the surface to be adhered to a variety of substrates.

Inventors:
 [1]
  1. Paradise Hills, NM
Issue Date:
Research Org.:
AT&T
OSTI Identifier:
867090
Patent Number(s):
4861408
Assignee:
United States of America as represented by United States (Washington, DC)
Patent Classifications (CPCs):
B - PERFORMING OPERATIONS B32 - LAYERED PRODUCTS B32B - LAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
B - PERFORMING OPERATIONS B29 - WORKING OF PLASTICS B29C - SHAPING OR JOINING OF PLASTICS
DOE Contract Number:  
AC04-76DP00789
Resource Type:
Patent
Country of Publication:
United States
Language:
English
Subject:
modification; polymeric; surface; improved; adhesion; via; electron; beam; exposure; treating; polymer; surfaces; teflon; particularly; 50-10; 000; ang; energy; radiation; 100-1000; vacuum; environment; 10; -6; torr; enhance; ability; adhered; variety; substrates; electron beam; energy electron; vacuum environment; polymer surface; electron radiation; polymer surfaces; /156/

Citation Formats

Kelber, Jeffry A. Modification of polymeric surface for improved adhesion via electron beam exposure. United States: N. p., 1989. Web.
Kelber, Jeffry A. Modification of polymeric surface for improved adhesion via electron beam exposure. United States.
Kelber, Jeffry A. Sun . "Modification of polymeric surface for improved adhesion via electron beam exposure". United States. https://www.osti.gov/servlets/purl/867090.
@article{osti_867090,
title = {Modification of polymeric surface for improved adhesion via electron beam exposure},
author = {Kelber, Jeffry A},
abstractNote = {Treating polymer surfaces, e.g., Teflon, particularly very thin surfaces, e.g., 50-10,000 .ANG. with low energy electron radiation, e.g., 100-1000 eV, in a high vacuum environment, e.g., less than 10.sup.-6 Torr, to enhance the ability of the surface to be adhered to a variety of substrates.},
doi = {},
journal = {},
number = ,
volume = ,
place = {United States},
year = {1989},
month = {1}
}

Patent:

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