Laser-driven fusion etching process
Abstract
The surfaces of solid ionic substrates are etched by a radiation-driven chemical reaction. The process involves exposing an ionic substrate coated with a layer of a reactant material on its surface to radiation, e.g. a laser, to induce localized melting of the substrate which results in the occurrance of a fusion reaction between the substrate and coating material. The resultant reaction product and excess reactant salt are then removed from the surface of the substrate with a solvent which is relatively inert towards the substrate. The laser-driven chemical etching process is especially suitable for etching ionic salt substrates, e.g., a solid inorganic salt such as LiNbO.sub.3, such as used in electro-optical/acousto-optic devices. It is also suitable for applications wherein the etching process is required to produce an etched ionic substrate having a smooth surface morphology or when a very rapid etching rate is desired.
- Inventors:
-
- Edgewood, NM
- Albuquerque, NM
- Issue Date:
- Research Org.:
- AT&T
- OSTI Identifier:
- 866996
- Patent Number(s):
- 4838989
- Assignee:
- United States of America as represented by United States (Washington, DC)
- Patent Classifications (CPCs):
-
C - CHEMISTRY C04 - CEMENTS C04B - LIME, MAGNESIA
C - CHEMISTRY C23 - COATING METALLIC MATERIAL C23F - NON-MECHANICAL REMOVAL OF METALLIC MATERIAL FROM SURFACE
- DOE Contract Number:
- AC04-76DP00789
- Resource Type:
- Patent
- Country of Publication:
- United States
- Language:
- English
- Subject:
- laser-driven; fusion; etching; process; surfaces; solid; ionic; substrates; etched; radiation-driven; chemical; reaction; involves; exposing; substrate; coated; layer; reactant; material; surface; radiation; laser; induce; localized; melting; results; occurrance; coating; resultant; product; excess; salt; removed; solvent; relatively; inert; towards; especially; suitable; inorganic; linbo; electro-optical; acousto-optic; devices; applications; required; produce; smooth; morphology; rapid; rate; desired; reactant material; relatively inert; coating material; etching process; chemical etching; smooth surface; process involves; chemical reaction; reaction product; substrate coated; especially suitable; solid inorganic; organic salt; fusion reaction; driven fusion; salt substrates; optic device; inorganic salt; surface morphology; salt substrate; laser-driven fusion; ionic substrate; involves exposing; /216/427/430/
Citation Formats
Ashby, Carol I. H., Brannon, Paul J, and Gerardo, James B. Laser-driven fusion etching process. United States: N. p., 1989.
Web.
Ashby, Carol I. H., Brannon, Paul J, & Gerardo, James B. Laser-driven fusion etching process. United States.
Ashby, Carol I. H., Brannon, Paul J, and Gerardo, James B. Sun .
"Laser-driven fusion etching process". United States. https://www.osti.gov/servlets/purl/866996.
@article{osti_866996,
title = {Laser-driven fusion etching process},
author = {Ashby, Carol I. H. and Brannon, Paul J and Gerardo, James B},
abstractNote = {The surfaces of solid ionic substrates are etched by a radiation-driven chemical reaction. The process involves exposing an ionic substrate coated with a layer of a reactant material on its surface to radiation, e.g. a laser, to induce localized melting of the substrate which results in the occurrance of a fusion reaction between the substrate and coating material. The resultant reaction product and excess reactant salt are then removed from the surface of the substrate with a solvent which is relatively inert towards the substrate. The laser-driven chemical etching process is especially suitable for etching ionic salt substrates, e.g., a solid inorganic salt such as LiNbO.sub.3, such as used in electro-optical/acousto-optic devices. It is also suitable for applications wherein the etching process is required to produce an etched ionic substrate having a smooth surface morphology or when a very rapid etching rate is desired.},
doi = {},
journal = {},
number = ,
volume = ,
place = {United States},
year = {1989},
month = {1}
}