Title: Poly(silyl silane)homo and copolymers

Abstract

Poly(silyl silanes) have been prepared. They have high photosensitivity and excellent resistance to oxygen-reactive ion etching processes. They are useful as photodepolymerizable photoresists, barrier layers, etc.

Inventors:

Zeigler, John M ^[1]

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1. 2208 Lester Dr. NE., Albuquerque, NM 87112

Issue Date:

1989-01-01

Research Org.:

AT&T

OSTI Identifier:

866913

Patent Number(s):

4820788

Assignee:

John M. Zeigler (Albuquerque, NM)

Patent Classifications (CPCs):

C - CHEMISTRY C08 - ORGANIC MACROMOLECULAR COMPOUNDS C08G - MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS

G - PHYSICS G03 - PHOTOGRAPHY G03F - PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES

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C - CHEMISTRY C08 - ORGANIC MACROMOLECULAR COMPOUNDS C08G - MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS

C08G77/485 - {containing less than 25 silicon atoms}
C08G77/60 - in which all the silicon atoms are connected by linkages other than oxygen atoms

G - PHYSICS G03 - PHOTOGRAPHY G03F - PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES

G03F7/0754 - {Non-macromolecular compounds containing silicon-to-silicon bonds

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DOE Contract Number:  

AC04-76DP00789

Resource Type:

Patent

Country of Publication:

United States

Language:

English

Subject:

poly; silyl; silane; homo; copolymers; silanes; prepared; photosensitivity; excellent; resistance; oxygen-reactive; etching; processes; useful; photodepolymerizable; photoresists; barrier; layers; etc; etching process; barrier layer; barrier layers; silyl silanes; silyl silane; excellent resistance; etching processes; photodepolymerizable photoresists; /528/430/999/