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Title: Method and apparatus for removing and preventing window deposition during photochemical vapor deposition (photo-CVD) processes

Abstract

Unwanted build-up of the film deposited on the transparent light-transmitting window of a photochemical vacuum deposition (photo-CVD) chamber is eliminated by flowing an etchant into the part of the photolysis region in the chamber immediately adjacent the window and remote from the substrate and from the process gas inlet. The respective flows of the etchant and the process gas are balanced to confine the etchant reaction to the part of the photolysis region proximate to the window and remote from the substrate. The etchant is preferably one that etches film deposit on the window, does not etch or affect the window itself, and does not produce reaction by-products that are deleterious to either the desired film deposited on the substrate or to the photolysis reaction adjacent the substrate.

Inventors:
 [1];  [2]
  1. (Lakewood, CO)
  2. (Boulder, CO)
Issue Date:
Research Org.:
MIDWEST RESEARCH INSTITUTE
OSTI Identifier:
866895
Patent Number(s):
4816294
Assignee:
Midwest Research Institute (Kansas City, MO) NREL
DOE Contract Number:  
AC02-83CH10093
Resource Type:
Patent
Country of Publication:
United States
Language:
English
Subject:
method; apparatus; removing; preventing; window; deposition; photochemical; vapor; photo-cvd; processes; unwanted; build-up; film; deposited; transparent; light-transmitting; vacuum; chamber; eliminated; flowing; etchant; photolysis; region; immediately; adjacent; remote; substrate; process; gas; inlet; respective; flows; balanced; confine; reaction; proximate; preferably; etches; deposit; etch; affect; produce; by-products; deleterious; desired; photolysis region; vacuum deposition; process gas; gas inlet; chemical vapor; vapor deposition; immediately adjacent; film deposited; photochemical vapor; transparent light; light-transmitting window; /427/136/216/

Citation Formats

Tsuo, Simon, and Langford, Alison A. Method and apparatus for removing and preventing window deposition during photochemical vapor deposition (photo-CVD) processes. United States: N. p., 1989. Web.
Tsuo, Simon, & Langford, Alison A. Method and apparatus for removing and preventing window deposition during photochemical vapor deposition (photo-CVD) processes. United States.
Tsuo, Simon, and Langford, Alison A. Sun . "Method and apparatus for removing and preventing window deposition during photochemical vapor deposition (photo-CVD) processes". United States. https://www.osti.gov/servlets/purl/866895.
@article{osti_866895,
title = {Method and apparatus for removing and preventing window deposition during photochemical vapor deposition (photo-CVD) processes},
author = {Tsuo, Simon and Langford, Alison A.},
abstractNote = {Unwanted build-up of the film deposited on the transparent light-transmitting window of a photochemical vacuum deposition (photo-CVD) chamber is eliminated by flowing an etchant into the part of the photolysis region in the chamber immediately adjacent the window and remote from the substrate and from the process gas inlet. The respective flows of the etchant and the process gas are balanced to confine the etchant reaction to the part of the photolysis region proximate to the window and remote from the substrate. The etchant is preferably one that etches film deposit on the window, does not etch or affect the window itself, and does not produce reaction by-products that are deleterious to either the desired film deposited on the substrate or to the photolysis reaction adjacent the substrate.},
doi = {},
journal = {},
number = ,
volume = ,
place = {United States},
year = {1989},
month = {1}
}

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