Method of processing materials using an inductively coupled plasma
Abstract
A method for coating surfaces or implanting ions in an object using an inductively coupled plasma. The method provides a gas-free environment, since the plasma is formed without using a gas. The coating material or implantation material is intitially in solid form.
- Inventors:
-
- Los Alamos, NM
- Issue Date:
- Research Org.:
- Los Alamos National Laboratory (LANL), Los Alamos, NM (United States)
- OSTI Identifier:
- 866809
- Patent Number(s):
- 4795879
- Assignee:
- United States of America as represented by United States (Washington, DC)
- Patent Classifications (CPCs):
-
C - CHEMISTRY C23 - COATING METALLIC MATERIAL C23C - COATING METALLIC MATERIAL
H - ELECTRICITY H01 - BASIC ELECTRIC ELEMENTS H01J - ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- DOE Contract Number:
- W-7405-ENG-36
- Resource Type:
- Patent
- Country of Publication:
- United States
- Language:
- English
- Subject:
- method; processing; materials; inductively; coupled; plasma; coating; surfaces; implanting; provides; gas-free; environment; formed; gas; material; implantation; intitially; solid; form; solid form; coating material; inductively coupled; coupled plasma; method provides; method provide; processing materials; coating surface; gas-free environment; /219/315/427/
Citation Formats
Hull, Donald E, and Bieniewski, Thomas M. Method of processing materials using an inductively coupled plasma. United States: N. p., 1989.
Web.
Hull, Donald E, & Bieniewski, Thomas M. Method of processing materials using an inductively coupled plasma. United States.
Hull, Donald E, and Bieniewski, Thomas M. Sun .
"Method of processing materials using an inductively coupled plasma". United States. https://www.osti.gov/servlets/purl/866809.
@article{osti_866809,
title = {Method of processing materials using an inductively coupled plasma},
author = {Hull, Donald E and Bieniewski, Thomas M},
abstractNote = {A method for coating surfaces or implanting ions in an object using an inductively coupled plasma. The method provides a gas-free environment, since the plasma is formed without using a gas. The coating material or implantation material is intitially in solid form.},
doi = {},
journal = {},
number = ,
volume = ,
place = {United States},
year = {Sun Jan 01 00:00:00 EST 1989},
month = {Sun Jan 01 00:00:00 EST 1989}
}
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