Resistance probe for energetic particle dosimetry

Title: Resistance probe for energetic particle dosimetry

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Abstract

A probe for determining the energy and flux of particles in a plasma comprises a carbon film adapted to be exposed to the plasma, the film havinmg an electrical resistance which is related to the number of particles impacting the film, contacts for passing an electrical current through the film, and contacts for determining the electrical resistance of the film. An improved method for determining the energy or flux of particles in a plasma is also disclosed.

Inventors:

Wampler, William R. ^[1]

(Albuquerque, NM)

Issue Date:: 1988-01-01

Research Org.:: AT & T CORP

OSTI Identifier:: 866701

Patent Number(s):: 4767591

Assignee:: United States of America as represented by Department of Energy (Washington, DC) SNL

DOE Contract Number:: AC04-76DP00789

Resource Type:: Patent

Country of Publication:: United States

Language:: English

Subject:: resistance; probe; energetic; particle; dosimetry; determining; energy; flux; particles; plasma; comprises; carbon; film; adapted; exposed; havinmg; electrical; related; impacting; contacts; passing; current; improved; method; disclosed; improved method; electrical resistance; electrical current; carbon film; plasma comprises; particles impact; /376/324/

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                    Wampler, William R. Resistance probe for energetic particle dosimetry.  United States: N. p., 1988. 
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                    Wampler, William R. Resistance probe for energetic particle dosimetry.  United States.

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                    Wampler, William R. Fri .  
        "Resistance probe for energetic particle dosimetry".  United States.  https://www.osti.gov/servlets/purl/866701.

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@article{osti_866701,

  title        = {Resistance probe for energetic particle dosimetry},

  author       = {Wampler, William R.},

  abstractNote = {A probe for determining the energy and flux of particles in a plasma comprises a carbon film adapted to be exposed to the plasma, the film havinmg an electrical resistance which is related to the number of particles impacting the film, contacts for passing an electrical current through the film, and contacts for determining the electrical resistance of the film. An improved method for determining the energy or flux of particles in a plasma is also disclosed.},

  doi          = {},

  journal      = {},
number       = ,

  volume       = ,

  place        = {United States},

  year         = {1988},

  month        = {1}

}

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