Resistance probe for energetic particle dosimetry
Abstract
A probe for determining the energy and flux of particles in a plasma comprises a carbon film adapted to be exposed to the plasma, the film havinmg an electrical resistance which is related to the number of particles impacting the film, contacts for passing an electrical current through the film, and contacts for determining the electrical resistance of the film. An improved method for determining the energy or flux of particles in a plasma is also disclosed.
- Inventors:
-
- Albuquerque, NM
- Issue Date:
- Research Org.:
- AT&T
- OSTI Identifier:
- 866701
- Patent Number(s):
- 4767591
- Assignee:
- United States of America as represented by Department of Energy (Washington, DC)
- Patent Classifications (CPCs):
-
G - PHYSICS G01 - MEASURING G01N - INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
H - ELECTRICITY H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR H05H - PLASMA TECHNIQUE
- DOE Contract Number:
- AC04-76DP00789
- Resource Type:
- Patent
- Country of Publication:
- United States
- Language:
- English
- Subject:
- resistance; probe; energetic; particle; dosimetry; determining; energy; flux; particles; plasma; comprises; carbon; film; adapted; exposed; havinmg; electrical; related; impacting; contacts; passing; current; improved; method; disclosed; improved method; electrical resistance; electrical current; carbon film; plasma comprises; particles impact; /376/324/
Citation Formats
Wampler, William R. Resistance probe for energetic particle dosimetry. United States: N. p., 1988.
Web.
Wampler, William R. Resistance probe for energetic particle dosimetry. United States.
Wampler, William R. Fri .
"Resistance probe for energetic particle dosimetry". United States. https://www.osti.gov/servlets/purl/866701.
@article{osti_866701,
title = {Resistance probe for energetic particle dosimetry},
author = {Wampler, William R},
abstractNote = {A probe for determining the energy and flux of particles in a plasma comprises a carbon film adapted to be exposed to the plasma, the film havinmg an electrical resistance which is related to the number of particles impacting the film, contacts for passing an electrical current through the film, and contacts for determining the electrical resistance of the film. An improved method for determining the energy or flux of particles in a plasma is also disclosed.},
doi = {},
journal = {},
number = ,
volume = ,
place = {United States},
year = {Fri Jan 01 00:00:00 EST 1988},
month = {Fri Jan 01 00:00:00 EST 1988}
}
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