Ion cyclotron range of frequencies heating of plasma with small impurity production

Ohkawa, Tihiro

Title: Ion cyclotron range of frequencies heating of plasma with small impurity production

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Abstract

Plasma including plasma ions is magnetically confined by a magnetic field. The plasma has a defined outer surface and is intersected by resonance surfaces of respective common ion cyclotron frequency of a predetermined species of plasma ions moving in the magnetic field. A radio frequency source provides radio frequency power at a radio frequency corresponding to the ion cyclotron frequency of the predetermined species of plasma ions moving in the field at a respective said resonance surface. RF launchers coupled to the radio frequency source radiate radio frequency energy at the resonance frequency onto the respective resonance surface within the plasma from a plurality of locations located outside the plasma at such respective distances from the intersections of the respective resonance surface and the defined outer surface and at such relative phases that the resulting interference pattern provides substantially null net radio frequency energy over regions near and including substantial portions of the intersections relative to the radio frequency energy provided thereby at other portions of the respective resonance surface within the plasma.

Inventors:

Ohkawa, Tihiro ^[1]

La Jolla, CA

Issue Date:: 1987-01-01

Research Org.:: CALIFORNIA INSTITUTE OF TECH

OSTI Identifier:: 866437

Patent Number(s):: 4710339

Assignee:: United States of America as represented by United States (Washington, DC)

Patent Classifications (CPCs):: Y - NEW / CROSS SECTIONAL TECHNOLOGIES Y02 - TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE Y02E - REDUCTION OF GREENHOUSE GAS [GHG] EMISSIONS, RELATED TO ENERGY GENERATION, TRANSMISSION OR DISTRIBUTION

H - ELECTRICITY H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR H05H - PLASMA TECHNIQUE

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Y - NEW / CROSS SECTIONAL TECHNOLOGIES Y02 - TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE Y02E - REDUCTION OF GREENHOUSE GAS [GHG] EMISSIONS, RELATED TO ENERGY GENERATION, TRANSMISSION OR DISTRIBUTION
Y02E30/10 - Fusion reactors

H - ELECTRICITY H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR H05H - PLASMA TECHNIQUE
H05H1/18 - wherein the fields oscillate at very high frequency, e.g. in the microwave range {, e.g. using cyclotron resonance}

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DOE Contract Number:: AC03-84ER51044

Resource Type:: Patent

Country of Publication:: United States

Language:: English

Subject:: cyclotron; range; frequencies; heating; plasma; impurity; production; including; magnetically; confined; magnetic; field; defined; outer; surface; intersected; resonance; surfaces; respective; common; frequency; predetermined; species; moving; radio; source; provides; power; corresponding; rf; launchers; coupled; radiate; energy; plurality; locations; located; outside; distances; intersections; relative; phases; resulting; interference; pattern; substantially; net; regions; near; substantial; portions; provided; source provides; relative phase; substantial portion; interference pattern; radio frequency; magnetic field; outer surface; located outside; magnetically confined; frequency source; resonance frequency; frequency energy; provides substantially; provides substantial; plasma including; energy provided; frequency power; cyclotron frequency; /376/

Citation Formats


                    Ohkawa, Tihiro. Ion cyclotron range of frequencies heating of plasma with small impurity production.  United States: N. p., 1987. 
        Web.

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                    Ohkawa, Tihiro. Ion cyclotron range of frequencies heating of plasma with small impurity production.  United States.

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                    Ohkawa, Tihiro. Thu .  
        "Ion cyclotron range of frequencies heating of plasma with small impurity production".  United States.  https://www.osti.gov/servlets/purl/866437.

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@article{osti_866437,

  title        = {Ion cyclotron range of frequencies heating of plasma with small impurity production},

  author       = {Ohkawa, Tihiro},

  abstractNote = {Plasma including plasma ions is magnetically confined by a magnetic field. The plasma has a defined outer surface and is intersected by resonance surfaces of respective common ion cyclotron frequency of a predetermined species of plasma ions moving in the magnetic field. A radio frequency source provides radio frequency power at a radio frequency corresponding to the ion cyclotron frequency of the predetermined species of plasma ions moving in the field at a respective said resonance surface. RF launchers coupled to the radio frequency source radiate radio frequency energy at the resonance frequency onto the respective resonance surface within the plasma from a plurality of locations located outside the plasma at such respective distances from the intersections of the respective resonance surface and the defined outer surface and at such relative phases that the resulting interference pattern provides substantially null net radio frequency energy over regions near and including substantial portions of the intersections relative to the radio frequency energy provided thereby at other portions of the respective resonance surface within the plasma.},

  doi          = {},

  journal      = {},
number       = ,

  volume       = ,

  place        = {United States},

  year         = {1987},

  month        = {1}

}

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