Liquid metal ion source and alloy for ion emission of multiple ionic species
Abstract
A liquid metal ion source and alloy for the simultaneous ion evaporation of arsenic and boron, arsenic and phosphorus, or arsenic, boron and phosphorus. The ionic species to be evaporated are contained in palladium-arsenic-boron and palladium-arsenic-boron-phosphorus alloys. The ion source, including an emitter means such as a needle emitter and a source means such as U-shaped heater element, is preferably constructed of rhenium and tungsten, both of which are readily fabricated. The ion sources emit continuous beams of ions having sufficiently high currents of the desired species to be useful in ion implantation of semiconductor wafers for preparing integrated circuit devices. The sources are stable in operation, experience little corrosion during operation, and have long operating lifetimes.
- Inventors:
-
- (Thousand Oaks, CA)
- Saugus, CA
- Oxnard, CA
- Los Alamos, NM
- McMinnville, OR
- Issue Date:
- OSTI Identifier:
- 866272
- Patent Number(s):
- 4670685
- Application Number:
- 06/851,755
- Assignee:
- Hughes Aircraft Company (Los Angeles, CA)
- Patent Classifications (CPCs):
-
H - ELECTRICITY H01 - BASIC ELECTRIC ELEMENTS H01J - ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- DOE Contract Number:
- 83F842300
- Resource Type:
- Patent
- Country of Publication:
- United States
- Language:
- English
- Subject:
- liquid; metal; source; alloy; emission; multiple; ionic; species; simultaneous; evaporation; arsenic; boron; phosphorus; evaporated; contained; palladium-arsenic-boron; palladium-arsenic-boron-phosphorus; alloys; including; emitter; means; needle; u-shaped; heater; element; preferably; constructed; rhenium; tungsten; readily; fabricated; sources; emit; continuous; beams; sufficiently; currents; desired; useful; implantation; semiconductor; wafers; preparing; integrated; circuit; devices; stable; operation; experience; corrosion; operating; lifetimes; semiconductor wafers; preferably constructed; operating life; source means; semiconductor wafer; liquid metal; integrated circuit; circuit device; operating lifetime; operating lifetimes; ionic species; circuit devices; heater element; /313/250/
Citation Formats
Clark, Jr., William M., Utlaut, Mark W, Wysocki, Joseph A, Storms, Edmund K, Szklarz, Eugene G, Behrens, Robert G, Swanson, Lynwood W, and Bell, Anthony E. Liquid metal ion source and alloy for ion emission of multiple ionic species. United States: N. p., 1987.
Web.
Clark, Jr., William M., Utlaut, Mark W, Wysocki, Joseph A, Storms, Edmund K, Szklarz, Eugene G, Behrens, Robert G, Swanson, Lynwood W, & Bell, Anthony E. Liquid metal ion source and alloy for ion emission of multiple ionic species. United States.
Clark, Jr., William M., Utlaut, Mark W, Wysocki, Joseph A, Storms, Edmund K, Szklarz, Eugene G, Behrens, Robert G, Swanson, Lynwood W, and Bell, Anthony E. Tue .
"Liquid metal ion source and alloy for ion emission of multiple ionic species". United States. https://www.osti.gov/servlets/purl/866272.
@article{osti_866272,
title = {Liquid metal ion source and alloy for ion emission of multiple ionic species},
author = {Clark, Jr., William M. and Utlaut, Mark W and Wysocki, Joseph A and Storms, Edmund K and Szklarz, Eugene G and Behrens, Robert G and Swanson, Lynwood W and Bell, Anthony E},
abstractNote = {A liquid metal ion source and alloy for the simultaneous ion evaporation of arsenic and boron, arsenic and phosphorus, or arsenic, boron and phosphorus. The ionic species to be evaporated are contained in palladium-arsenic-boron and palladium-arsenic-boron-phosphorus alloys. The ion source, including an emitter means such as a needle emitter and a source means such as U-shaped heater element, is preferably constructed of rhenium and tungsten, both of which are readily fabricated. The ion sources emit continuous beams of ions having sufficiently high currents of the desired species to be useful in ion implantation of semiconductor wafers for preparing integrated circuit devices. The sources are stable in operation, experience little corrosion during operation, and have long operating lifetimes.},
doi = {},
journal = {},
number = ,
volume = ,
place = {United States},
year = {Tue Jun 02 00:00:00 EDT 1987},
month = {Tue Jun 02 00:00:00 EDT 1987}
}
Save to My Library
You must Sign In or Create an Account in order to save documents to your library.