Apparatus and method for depositing coating onto porous substrate
Abstract
Disclosed is an apparatus for forming a chemically vapor deposited coating on a porous substrate where oxygen from a first gaseous reactant containing a source of oxygen permeates through the pores of the substrate to react with a second gaseous reactant that is present on the other side of the substrate. The apparatus includes means for controlling the pressure and flow rate of each gaseous reactant, a manometer for measuring the difference in pressure between the gaseous reactants on each side of the substrate, and means for changing the difference in pressure between the gaseous reactants. Also disclosed is a method of detecting and closing cracks in the coating by reducing the pressure difference between the two gaseous reactants whenever the pressure difference falls suddenly after gradually rising, then again increasing the pressure difference on the two gases. The attack by the by-products of the reaction on the substrate are reduced by maintaining the flow rate of the first reactant through the pores of the substrate.
- Inventors:
-
- Forest Hills Boro, PA
- Penn Hills Township, Allegheny County, PA
- Issue Date:
- Research Org.:
- Westinghouse Electric Corp., Pittsburgh, PA (United States)
- OSTI Identifier:
- 865972
- Patent Number(s):
- 4609562
- Assignee:
- Westinghouse Electric Corp. (Pittsburgh, PA)
- Patent Classifications (CPCs):
-
C - CHEMISTRY C04 - CEMENTS C04B - LIME, MAGNESIA
C - CHEMISTRY C23 - COATING METALLIC MATERIAL C23C - COATING METALLIC MATERIAL
- DOE Contract Number:
- AC02-80ET17089
- Resource Type:
- Patent
- Country of Publication:
- United States
- Language:
- English
- Subject:
- apparatus; method; depositing; coating; porous; substrate; disclosed; forming; chemically; vapor; deposited; oxygen; gaseous; reactant; containing; source; permeates; pores; react; means; controlling; pressure; flow; rate; manometer; measuring; difference; reactants; changing; detecting; closing; cracks; reducing; whenever; falls; suddenly; gradually; rising; increasing; gases; attack; by-products; reaction; reduced; maintaining; deposited coating; gaseous reactants; vapor deposited; gaseous reactant; flow rate; porous substrate; pressure difference; chemically vapor; /427/118/
Citation Formats
Isenberg, Arnold O, and Zymboly, Gregory E. Apparatus and method for depositing coating onto porous substrate. United States: N. p., 1986.
Web.
Isenberg, Arnold O, & Zymboly, Gregory E. Apparatus and method for depositing coating onto porous substrate. United States.
Isenberg, Arnold O, and Zymboly, Gregory E. Wed .
"Apparatus and method for depositing coating onto porous substrate". United States. https://www.osti.gov/servlets/purl/865972.
@article{osti_865972,
title = {Apparatus and method for depositing coating onto porous substrate},
author = {Isenberg, Arnold O and Zymboly, Gregory E},
abstractNote = {Disclosed is an apparatus for forming a chemically vapor deposited coating on a porous substrate where oxygen from a first gaseous reactant containing a source of oxygen permeates through the pores of the substrate to react with a second gaseous reactant that is present on the other side of the substrate. The apparatus includes means for controlling the pressure and flow rate of each gaseous reactant, a manometer for measuring the difference in pressure between the gaseous reactants on each side of the substrate, and means for changing the difference in pressure between the gaseous reactants. Also disclosed is a method of detecting and closing cracks in the coating by reducing the pressure difference between the two gaseous reactants whenever the pressure difference falls suddenly after gradually rising, then again increasing the pressure difference on the two gases. The attack by the by-products of the reaction on the substrate are reduced by maintaining the flow rate of the first reactant through the pores of the substrate.},
doi = {},
journal = {},
number = ,
volume = ,
place = {United States},
year = {Wed Jan 01 00:00:00 EST 1986},
month = {Wed Jan 01 00:00:00 EST 1986}
}