Graphoepitaxy by encapsulation
Abstract
Improvements on the graphoepitaxial process for obtaining epitaxial or preferred orientation films are described wherein a cap of material is formed over the film to be oriented, artificial surface-relief structure may be present in the substrate, the cap, or both, and the film may be heated by irradiation with electromagnetic radiation.
- Inventors:
-
- Acton, MA
- Sudbury, MA
- Brookline, MA
- Lexington, MA
- Issue Date:
- Research Org.:
- Massachusetts Inst. of Technology (MIT), Cambridge, MA (United States)
- OSTI Identifier:
- 865744
- Patent Number(s):
- 4565599
- Assignee:
- Massachusetts Institute of Technology (Cambridge, MA)
- Patent Classifications (CPCs):
-
C - CHEMISTRY C30 - CRYSTAL GROWTH C30B - SINGLE-CRYSTAL-GROWTH
H - ELECTRICITY H01 - BASIC ELECTRIC ELEMENTS H01L - SEMICONDUCTOR DEVICES
- DOE Contract Number:
- AC02-80ER10179
- Resource Type:
- Patent
- Country of Publication:
- United States
- Language:
- English
- Subject:
- graphoepitaxy; encapsulation; improvements; graphoepitaxial; process; obtaining; epitaxial; preferred; orientation; films; described; cap; material; formed; film; oriented; artificial; surface-relief; structure; substrate; heated; irradiation; electromagnetic; radiation; electromagnetic radiation; /117/148/
Citation Formats
Geis, Michael W, Smith, Henry I, Antoniadis, Dimitri A, and Flanders, Dale C. Graphoepitaxy by encapsulation. United States: N. p., 1986.
Web.
Geis, Michael W, Smith, Henry I, Antoniadis, Dimitri A, & Flanders, Dale C. Graphoepitaxy by encapsulation. United States.
Geis, Michael W, Smith, Henry I, Antoniadis, Dimitri A, and Flanders, Dale C. Wed .
"Graphoepitaxy by encapsulation". United States. https://www.osti.gov/servlets/purl/865744.
@article{osti_865744,
title = {Graphoepitaxy by encapsulation},
author = {Geis, Michael W and Smith, Henry I and Antoniadis, Dimitri A and Flanders, Dale C},
abstractNote = {Improvements on the graphoepitaxial process for obtaining epitaxial or preferred orientation films are described wherein a cap of material is formed over the film to be oriented, artificial surface-relief structure may be present in the substrate, the cap, or both, and the film may be heated by irradiation with electromagnetic radiation.},
doi = {},
journal = {},
number = ,
volume = ,
place = {United States},
year = {1986},
month = {1}
}
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