Di-p-xylylene polymer and method for making the same
Abstract
A method and apparatus for forming an improved poly-p-xylylene film. Solid di-para-xylylene dimer is sublimed in a sublimation furnace at approximately 100.degree. to 200.degree. C. and subsequently conducted to a pyrolysis furnace where it is pyrolyzed to the diradical p-xylylene monomer while in the vapor state at approximately 600 degrees C. The diradical monomer is then introduced into a deposition chamber for deposition onto a suitable substrate. The deposition chamber includes electrodes for producing a low pressure plasma through which the diradical monomer passes prior to deposition. The interaction of the diradical monomer with the low pressure plasma results in the formation of poly-p-xylylene film which is exceptionally hard and thermally stable.
- Inventors:
-
- Los Alamos, NM
- Issue Date:
- Research Org.:
- Los Alamos National Laboratory (LANL), Los Alamos, NM (United States)
- OSTI Identifier:
- 865352
- Patent Number(s):
- 4500562
- Assignee:
- United States of America as represented by United States (Washington, DC)
- Patent Classifications (CPCs):
-
B - PERFORMING OPERATIONS B05 - SPRAYING OR ATOMISING IN GENERAL B05D - PROCESSES FOR APPLYING LIQUIDS OR OTHER FLUENT MATERIALS TO SURFACES, IN GENERAL
- DOE Contract Number:
- W-7405-ENG-36
- Resource Type:
- Patent
- Country of Publication:
- United States
- Language:
- English
- Subject:
- di-p-xylylene; polymer; method; apparatus; forming; improved; poly-p-xylylene; film; solid; di-para-xylylene; dimer; sublimed; sublimation; furnace; approximately; 100; degree; 200; subsequently; conducted; pyrolysis; pyrolyzed; diradical; p-xylylene; monomer; vapor; 600; degrees; introduced; deposition; chamber; suitable; substrate; electrodes; producing; pressure; plasma; passes; prior; interaction; results; formation; exceptionally; hard; thermally; stable; pressure plasma; deposition chamber; thermally stable; suitable substrate; /427/204/528/
Citation Formats
Jahn, Randy K, and Liepins, Raimond. Di-p-xylylene polymer and method for making the same. United States: N. p., 1985.
Web.
Jahn, Randy K, & Liepins, Raimond. Di-p-xylylene polymer and method for making the same. United States.
Jahn, Randy K, and Liepins, Raimond. Tue .
"Di-p-xylylene polymer and method for making the same". United States. https://www.osti.gov/servlets/purl/865352.
@article{osti_865352,
title = {Di-p-xylylene polymer and method for making the same},
author = {Jahn, Randy K and Liepins, Raimond},
abstractNote = {A method and apparatus for forming an improved poly-p-xylylene film. Solid di-para-xylylene dimer is sublimed in a sublimation furnace at approximately 100.degree. to 200.degree. C. and subsequently conducted to a pyrolysis furnace where it is pyrolyzed to the diradical p-xylylene monomer while in the vapor state at approximately 600 degrees C. The diradical monomer is then introduced into a deposition chamber for deposition onto a suitable substrate. The deposition chamber includes electrodes for producing a low pressure plasma through which the diradical monomer passes prior to deposition. The interaction of the diradical monomer with the low pressure plasma results in the formation of poly-p-xylylene film which is exceptionally hard and thermally stable.},
doi = {},
journal = {},
number = ,
volume = ,
place = {United States},
year = {Tue Jan 01 00:00:00 EST 1985},
month = {Tue Jan 01 00:00:00 EST 1985}
}