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Title: Di-p-xylylene polymer and method for making the same

Abstract

A method and apparatus for forming an improved poly-p-xylylene film. Solid di-para-xylylene dimer is sublimed in a sublimation furnace at approximately 100.degree. to 200.degree. C. and subsequently conducted to a pyrolysis furnace where it is pyrolyzed to the diradical p-xylylene monomer while in the vapor state at approximately 600 degrees C. The diradical monomer is then introduced into a deposition chamber for deposition onto a suitable substrate. The deposition chamber includes electrodes for producing a low pressure plasma through which the diradical monomer passes prior to deposition. The interaction of the diradical monomer with the low pressure plasma results in the formation of poly-p-xylylene film which is exceptionally hard and thermally stable.

Inventors:
 [1];  [1]
  1. Los Alamos, NM
Issue Date:
Research Org.:
Los Alamos National Lab. (LANL), Los Alamos, NM (United States)
OSTI Identifier:
865352
Patent Number(s):
4500562
Assignee:
United States of America as represented by United States (Washington, DC)
DOE Contract Number:  
W-7405-ENG-36
Resource Type:
Patent
Country of Publication:
United States
Language:
English
Subject:
di-p-xylylene; polymer; method; apparatus; forming; improved; poly-p-xylylene; film; solid; di-para-xylylene; dimer; sublimed; sublimation; furnace; approximately; 100; degree; 200; subsequently; conducted; pyrolysis; pyrolyzed; diradical; p-xylylene; monomer; vapor; 600; degrees; introduced; deposition; chamber; suitable; substrate; electrodes; producing; pressure; plasma; passes; prior; interaction; results; formation; exceptionally; hard; thermally; stable; pressure plasma; deposition chamber; thermally stable; suitable substrate; /427/204/528/

Citation Formats

Jahn, Randy K, and Liepins, Raimond. Di-p-xylylene polymer and method for making the same. United States: N. p., 1985. Web.
Jahn, Randy K, & Liepins, Raimond. Di-p-xylylene polymer and method for making the same. United States.
Jahn, Randy K, and Liepins, Raimond. Tue . "Di-p-xylylene polymer and method for making the same". United States. https://www.osti.gov/servlets/purl/865352.
@article{osti_865352,
title = {Di-p-xylylene polymer and method for making the same},
author = {Jahn, Randy K and Liepins, Raimond},
abstractNote = {A method and apparatus for forming an improved poly-p-xylylene film. Solid di-para-xylylene dimer is sublimed in a sublimation furnace at approximately 100.degree. to 200.degree. C. and subsequently conducted to a pyrolysis furnace where it is pyrolyzed to the diradical p-xylylene monomer while in the vapor state at approximately 600 degrees C. The diradical monomer is then introduced into a deposition chamber for deposition onto a suitable substrate. The deposition chamber includes electrodes for producing a low pressure plasma through which the diradical monomer passes prior to deposition. The interaction of the diradical monomer with the low pressure plasma results in the formation of poly-p-xylylene film which is exceptionally hard and thermally stable.},
doi = {},
journal = {},
number = ,
volume = ,
place = {United States},
year = {1985},
month = {1}
}

Patent:

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