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Title: Nitrogen fixation apparatus

Abstract

A method and apparatus for achieving nitrogen fixation includes a volumetric electric discharge chamber. The volumetric discharge chamber provides an even distribution of an electron beam, and enables the chamber to be maintained at a controlled energy to pressure (E/p) ratio. An E/p ratio of from 5 to 15 kV/atm of O.sub.2 /cm promotes the formation of vibrationally excited N.sub.2. Atomic oxygen interacts with vibrationally excited N.sub.2 at a much quicker rate than unexcited N.sub.2, greatly improving the rate at which NO is formed.

Inventors:
 [1]
  1. (Walnut Creek, CA)
Issue Date:
Research Org.:
Lawrence Livermore National Lab. (LLNL), Livermore, CA (United States)
OSTI Identifier:
865251
Patent Number(s):
4482525
Assignee:
United States of America as represented by United States (Washington, DC) LLNL
DOE Contract Number:  
W-7405-ENG-48
Resource Type:
Patent
Country of Publication:
United States
Language:
English
Subject:
nitrogen; fixation; apparatus; method; achieving; volumetric; electric; discharge; chamber; provides; distribution; electron; beam; enables; maintained; controlled; energy; pressure; ratio; 15; kv; atm; cm; promotes; formation; vibrationally; excited; atomic; oxygen; interacts; quicker; rate; unexcited; greatly; improving; formed; chamber provides; nitrogen fixation; electron beam; electric discharge; volumetric discharge; atomic oxygen; chamber provide; discharge chamber; greatly improving; volumetric electric; vibrationally excite; achieving nitrogen; /422/204/

Citation Formats

Chen, Hao-Lin. Nitrogen fixation apparatus. United States: N. p., 1984. Web.
Chen, Hao-Lin. Nitrogen fixation apparatus. United States.
Chen, Hao-Lin. Sun . "Nitrogen fixation apparatus". United States. https://www.osti.gov/servlets/purl/865251.
@article{osti_865251,
title = {Nitrogen fixation apparatus},
author = {Chen, Hao-Lin},
abstractNote = {A method and apparatus for achieving nitrogen fixation includes a volumetric electric discharge chamber. The volumetric discharge chamber provides an even distribution of an electron beam, and enables the chamber to be maintained at a controlled energy to pressure (E/p) ratio. An E/p ratio of from 5 to 15 kV/atm of O.sub.2 /cm promotes the formation of vibrationally excited N.sub.2. Atomic oxygen interacts with vibrationally excited N.sub.2 at a much quicker rate than unexcited N.sub.2, greatly improving the rate at which NO is formed.},
doi = {},
journal = {},
number = ,
volume = ,
place = {United States},
year = {1984},
month = {1}
}

Patent:

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