skip to main content
DOE Patents title logo U.S. Department of Energy
Office of Scientific and Technical Information

Title: Glow discharge plasma deposition of thin films

Abstract

A glow discharge plasma reactor for deposition of thin films from a reactive RF glow discharge is provided with a screen positioned between the walls of the chamber and the cathode to confine the glow discharge region to within the region defined by the screen and the cathode. A substrate for receiving deposition material from a reactive gas is positioned outside the screened region. The screen is electrically connected to the system ground to thereby serve as the anode of the system. The energy of the reactive gas species is reduced as they diffuse through the screen to the substrate. Reactive gas is conducted directly into the glow discharge region through a centrally positioned distribution head to reduce contamination effects otherwise caused by secondary reaction products and impurities deposited on the reactor walls.

Inventors:
 [1];  [2]
  1. (Pennington, NJ)
  2. (Bridgewater, NJ)
Issue Date:
OSTI Identifier:
865021
Patent Number(s):
4450787
Application Number:
06/386,686
Assignee:
RCA Corporation (New York, NY) OSTI
DOE Contract Number:  
XG-O-9372-1
Resource Type:
Patent
Country of Publication:
United States
Language:
English
Subject:
glow; discharge; plasma; deposition; films; reactor; reactive; rf; provided; screen; positioned; walls; chamber; cathode; confine; region; defined; substrate; receiving; material; gas; outside; screened; electrically; connected; ground; serve; anode; energy; species; reduced; diffuse; conducted; directly; centrally; distribution; head; reduce; contamination; effects; otherwise; caused; secondary; reaction; products; impurities; deposited; region defined; reactive gas; discharge region; glow discharge; reaction product; reaction products; electrically connected; positioned outside; plasma deposition; discharge plasma; plasma reactor; reactor walls; otherwise caused; gas species; reactor wall; reduce contamination; reactive rf; /118/136/

Citation Formats

Weakliem, Herbert A., and Vossen, Jr., John L. Glow discharge plasma deposition of thin films. United States: N. p., 1984. Web.
Weakliem, Herbert A., & Vossen, Jr., John L. Glow discharge plasma deposition of thin films. United States.
Weakliem, Herbert A., and Vossen, Jr., John L. Tue . "Glow discharge plasma deposition of thin films". United States. https://www.osti.gov/servlets/purl/865021.
@article{osti_865021,
title = {Glow discharge plasma deposition of thin films},
author = {Weakliem, Herbert A. and Vossen, Jr., John L.},
abstractNote = {A glow discharge plasma reactor for deposition of thin films from a reactive RF glow discharge is provided with a screen positioned between the walls of the chamber and the cathode to confine the glow discharge region to within the region defined by the screen and the cathode. A substrate for receiving deposition material from a reactive gas is positioned outside the screened region. The screen is electrically connected to the system ground to thereby serve as the anode of the system. The energy of the reactive gas species is reduced as they diffuse through the screen to the substrate. Reactive gas is conducted directly into the glow discharge region through a centrally positioned distribution head to reduce contamination effects otherwise caused by secondary reaction products and impurities deposited on the reactor walls.},
doi = {},
journal = {},
number = ,
volume = ,
place = {United States},
year = {1984},
month = {5}
}

Patent:

Save / Share: