Glow discharge plasma deposition of thin films
Abstract
A glow discharge plasma reactor for deposition of thin films from a reactive RF glow discharge is provided with a screen positioned between the walls of the chamber and the cathode to confine the glow discharge region to within the region defined by the screen and the cathode. A substrate for receiving deposition material from a reactive gas is positioned outside the screened region. The screen is electrically connected to the system ground to thereby serve as the anode of the system. The energy of the reactive gas species is reduced as they diffuse through the screen to the substrate. Reactive gas is conducted directly into the glow discharge region through a centrally positioned distribution head to reduce contamination effects otherwise caused by secondary reaction products and impurities deposited on the reactor walls.
- Inventors:
-
- Pennington, NJ
- (Bridgewater, NJ)
- Issue Date:
- OSTI Identifier:
- 865021
- Patent Number(s):
- 4450787
- Application Number:
- 06/386,686
- Assignee:
- RCA Corporation (New York, NY)
- Patent Classifications (CPCs):
-
C - CHEMISTRY C23 - COATING METALLIC MATERIAL C23C - COATING METALLIC MATERIAL
H - ELECTRICITY H01 - BASIC ELECTRIC ELEMENTS H01J - ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- DOE Contract Number:
- XG-O-9372-1
- Resource Type:
- Patent
- Country of Publication:
- United States
- Language:
- English
- Subject:
- glow; discharge; plasma; deposition; films; reactor; reactive; rf; provided; screen; positioned; walls; chamber; cathode; confine; region; defined; substrate; receiving; material; gas; outside; screened; electrically; connected; ground; serve; anode; energy; species; reduced; diffuse; conducted; directly; centrally; distribution; head; reduce; contamination; effects; otherwise; caused; secondary; reaction; products; impurities; deposited; region defined; reactive gas; discharge region; glow discharge; reaction product; reaction products; electrically connected; positioned outside; plasma deposition; discharge plasma; plasma reactor; reactor walls; otherwise caused; gas species; reactor wall; reduce contamination; reactive rf; /118/136/
Citation Formats
Weakliem, Herbert A, and Vossen, Jr., John L. Glow discharge plasma deposition of thin films. United States: N. p., 1984.
Web.
Weakliem, Herbert A, & Vossen, Jr., John L. Glow discharge plasma deposition of thin films. United States.
Weakliem, Herbert A, and Vossen, Jr., John L. Tue .
"Glow discharge plasma deposition of thin films". United States. https://www.osti.gov/servlets/purl/865021.
@article{osti_865021,
title = {Glow discharge plasma deposition of thin films},
author = {Weakliem, Herbert A and Vossen, Jr., John L.},
abstractNote = {A glow discharge plasma reactor for deposition of thin films from a reactive RF glow discharge is provided with a screen positioned between the walls of the chamber and the cathode to confine the glow discharge region to within the region defined by the screen and the cathode. A substrate for receiving deposition material from a reactive gas is positioned outside the screened region. The screen is electrically connected to the system ground to thereby serve as the anode of the system. The energy of the reactive gas species is reduced as they diffuse through the screen to the substrate. Reactive gas is conducted directly into the glow discharge region through a centrally positioned distribution head to reduce contamination effects otherwise caused by secondary reaction products and impurities deposited on the reactor walls.},
doi = {},
journal = {},
number = ,
volume = ,
place = {United States},
year = {Tue May 29 00:00:00 EDT 1984},
month = {Tue May 29 00:00:00 EDT 1984}
}