Optical double-slit particle measuring system
Abstract
A method for in situ measurement of particle size is described. The size information is obtained by scanning an image of the particle across a double-slit mask and observing the transmitted light. This method is useful when the particle size of primary interest is 3 .mu.m and larger. The technique is well suited to applications in which the particles are non-spherical and have unknown refractive index. It is particularly well suited to high temperature environments in which the particle incandescence provides the light source.
- Inventors:
-
- Pleasanton, CA
- Freemont, CA
- Livermore, CA
- Issue Date:
- Research Org.:
- AT&T
- OSTI Identifier:
- 864942
- Patent Number(s):
- 4441816
- Assignee:
- United States of America as represented by United States (Washington, DC)
- Patent Classifications (CPCs):
-
G - PHYSICS G01 - MEASURING G01N - INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
- DOE Contract Number:
- AC04-76DP00789
- Resource Type:
- Patent
- Country of Publication:
- United States
- Language:
- English
- Subject:
- optical; double-slit; particle; measuring; method; situ; measurement; size; described; information; obtained; scanning; image; mask; observing; transmitted; light; useful; primary; larger; technique; suited; applications; particles; non-spherical; refractive; index; particularly; temperature; environments; incandescence; provides; source; transmitted light; light source; particle size; refractive index; temperature environments; situ measurement; temperature environment; size information; /356/
Citation Formats
Hencken, Kenneth R, Tichenor, Daniel A, and Wang, James C. F. Optical double-slit particle measuring system. United States: N. p., 1984.
Web.
Hencken, Kenneth R, Tichenor, Daniel A, & Wang, James C. F. Optical double-slit particle measuring system. United States.
Hencken, Kenneth R, Tichenor, Daniel A, and Wang, James C. F. Sun .
"Optical double-slit particle measuring system". United States. https://www.osti.gov/servlets/purl/864942.
@article{osti_864942,
title = {Optical double-slit particle measuring system},
author = {Hencken, Kenneth R and Tichenor, Daniel A and Wang, James C. F.},
abstractNote = {A method for in situ measurement of particle size is described. The size information is obtained by scanning an image of the particle across a double-slit mask and observing the transmitted light. This method is useful when the particle size of primary interest is 3 .mu.m and larger. The technique is well suited to applications in which the particles are non-spherical and have unknown refractive index. It is particularly well suited to high temperature environments in which the particle incandescence provides the light source.},
doi = {},
journal = {},
number = ,
volume = ,
place = {United States},
year = {1984},
month = {1}
}
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