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Title: Optical double-slit particle measuring system

Abstract

A method for in situ measurement of particle size is described. The size information is obtained by scanning an image of the particle across a double-slit mask and observing the transmitted light. This method is useful when the particle size of primary interest is 3 .mu.m and larger. The technique is well suited to applications in which the particles are non-spherical and have unknown refractive index. It is particularly well suited to high temperature environments in which the particle incandescence provides the light source.

Inventors:
 [1];  [2];  [3]
  1. (Pleasanton, CA)
  2. (Freemont, CA)
  3. (Livermore, CA)
Issue Date:
Research Org.:
AT & T CORP
OSTI Identifier:
864942
Patent Number(s):
4441816
Assignee:
United States of America as represented by United States (Washington, DC) SNL
DOE Contract Number:  
AC04-76DP00789
Resource Type:
Patent
Country of Publication:
United States
Language:
English
Subject:
optical; double-slit; particle; measuring; method; situ; measurement; size; described; information; obtained; scanning; image; mask; observing; transmitted; light; useful; primary; larger; technique; suited; applications; particles; non-spherical; refractive; index; particularly; temperature; environments; incandescence; provides; source; transmitted light; light source; particle size; refractive index; temperature environments; situ measurement; temperature environment; size information; /356/

Citation Formats

Hencken, Kenneth R., Tichenor, Daniel A., and Wang, James C. F. Optical double-slit particle measuring system. United States: N. p., 1984. Web.
Hencken, Kenneth R., Tichenor, Daniel A., & Wang, James C. F. Optical double-slit particle measuring system. United States.
Hencken, Kenneth R., Tichenor, Daniel A., and Wang, James C. F. Sun . "Optical double-slit particle measuring system". United States. https://www.osti.gov/servlets/purl/864942.
@article{osti_864942,
title = {Optical double-slit particle measuring system},
author = {Hencken, Kenneth R. and Tichenor, Daniel A. and Wang, James C. F.},
abstractNote = {A method for in situ measurement of particle size is described. The size information is obtained by scanning an image of the particle across a double-slit mask and observing the transmitted light. This method is useful when the particle size of primary interest is 3 .mu.m and larger. The technique is well suited to applications in which the particles are non-spherical and have unknown refractive index. It is particularly well suited to high temperature environments in which the particle incandescence provides the light source.},
doi = {},
journal = {},
number = ,
volume = ,
place = {United States},
year = {1984},
month = {1}
}

Patent:

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