Method of depositing a high-emissivity layer

Title: Method of depositing a high-emissivity layer

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Abstract

A method of depositing a high-emissivity layer on a substrate comprising RF sputter deposition of a carbide-containing target in an atmosphere of a hydrocarbon gas and a noble gas. As the carbide is deposited on the substrate the hydrocarbon gas decomposes to hydrogen and carbon. The carbon deposits on the target and substrate causing a carbide/carbon composition gradient to form on the substrate. At a sufficiently high partial pressure of hydrocarbon gas, a film of high-emissivity pure carbon will eventually form over the substrate.

Inventors:

Wickersham, Charles E ^[1]; Foster, Ellis L ^[2]

Columbus, OH
Powell, OH

Issue Date:: 1983-01-01

Research Org.:: Lawrence Livermore National Lab. (LLNL), Livermore, CA (United States)

OSTI Identifier:: 864770

Patent Number(s):: 4414085

Assignee:: Wickersham; Charles E. (Columbus, OH); Foster; Ellis L. (Powell, OH)

Patent Classifications (CPCs):: C - CHEMISTRY C23 - COATING METALLIC MATERIAL C23C - COATING METALLIC MATERIAL

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C - CHEMISTRY C23 - COATING METALLIC MATERIAL C23C - COATING METALLIC MATERIAL
C23C16/26 - Deposition of carbon only
C23C14/34 - Sputtering
C23C14/027 - {Graded interfaces}
C23C14/345 - {using substrate bias}
C23C14/0084 - {Producing gradient compositions}

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DOE Contract Number:: W-7405-ENG-48

Resource Type:: Patent

Country of Publication:: United States

Language:: English

Subject:: method; depositing; high-emissivity; layer; substrate; comprising; rf; sputter; deposition; carbide-containing; target; atmosphere; hydrocarbon; gas; noble; carbide; deposited; decomposes; hydrogen; carbon; deposits; causing; composition; gradient; form; sufficiently; partial; pressure; film; pure; eventually; substrate comprising; rf sputter; carbon deposits; pure carbon; sputter deposition; hydrocarbon gas; partial pressure; noble gas; sputter deposit; high-emissivity layer; rate comprising; carbon composition; /204/

Citation Formats


                    Wickersham, Charles E, and Foster, Ellis L. Method of depositing a high-emissivity layer.  United States: N. p., 1983. 
        Web.

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                    Wickersham, Charles E, & Foster, Ellis L. Method of depositing a high-emissivity layer.  United States.

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                    Wickersham, Charles E, and Foster, Ellis L. Sat .  
        "Method of depositing a high-emissivity layer".  United States.  https://www.osti.gov/servlets/purl/864770.

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@article{osti_864770,

  title        = {Method of depositing a high-emissivity layer},

  author       = {Wickersham, Charles E and Foster, Ellis L},

  abstractNote = {A method of depositing a high-emissivity layer on a substrate comprising RF sputter deposition of a carbide-containing target in an atmosphere of a hydrocarbon gas and a noble gas. As the carbide is deposited on the substrate the hydrocarbon gas decomposes to hydrogen and carbon. The carbon deposits on the target and substrate causing a carbide/carbon composition gradient to form on the substrate. At a sufficiently high partial pressure of hydrocarbon gas, a film of high-emissivity pure carbon will eventually form over the substrate.},

  doi          = {},

  journal      = {},
number       = ,

  volume       = ,

  place        = {United States},

  year         = {1983},

  month        = {1}

}

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