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Title: Negative ion source with hollow cathode discharge plasma

Abstract

A negative ion source of the type where negative ions are formed by bombarding a low-work-function surface with positive ions and neutral particles from a plasma, wherein a highly ionized plasma is injected into an anode space containing the low-work-function surface. The plasma is formed by hollow cathode discharge and injected into the anode space along the magnetic field lines. Preferably, the negative ion source is of the magnetron type.

Inventors:
 [1];  [2]
  1. (Mt. Sinai, NY)
  2. (Setauket, NY)
Issue Date:
Research Org.:
Brookhaven National Laboratory (BNL), Upton, NY
OSTI Identifier:
864524
Patent Number(s):
4377773
Assignee:
United States of America as represented by Department of Energy (Washington, DC) BNL
DOE Contract Number:  
AC02-76CH00016
Resource Type:
Patent
Country of Publication:
United States
Language:
English
Subject:
negative; source; hollow; cathode; discharge; plasma; type; formed; bombarding; low-work-function; surface; positive; neutral; particles; highly; ionized; injected; anode; space; containing; magnetic; field; lines; preferably; magnetron; neutral particle; neutral particles; hollow cathode; field lines; magnetic field; discharge plasma; ionized plasma; cathode discharge; node space; highly ionized; anode space; /315/250/313/376/

Citation Formats

Hershcovitch, Ady, and Prelec, Krsto. Negative ion source with hollow cathode discharge plasma. United States: N. p., 1983. Web.
Hershcovitch, Ady, & Prelec, Krsto. Negative ion source with hollow cathode discharge plasma. United States.
Hershcovitch, Ady, and Prelec, Krsto. Sat . "Negative ion source with hollow cathode discharge plasma". United States. https://www.osti.gov/servlets/purl/864524.
@article{osti_864524,
title = {Negative ion source with hollow cathode discharge plasma},
author = {Hershcovitch, Ady and Prelec, Krsto},
abstractNote = {A negative ion source of the type where negative ions are formed by bombarding a low-work-function surface with positive ions and neutral particles from a plasma, wherein a highly ionized plasma is injected into an anode space containing the low-work-function surface. The plasma is formed by hollow cathode discharge and injected into the anode space along the magnetic field lines. Preferably, the negative ion source is of the magnetron type.},
doi = {},
journal = {},
number = ,
volume = ,
place = {United States},
year = {1983},
month = {1}
}

Patent:

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