Electrostatic quadrupole array for focusing parallel beams of charged particles

Brodowski, John

Title: Electrostatic quadrupole array for focusing parallel beams of charged particles

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Abstract

An array of electrostatic quadrupoles, capable of providing strong electrostatic focusing simultaneously on multiple beams, is easily fabricated from a single array element comprising a support rod and multiple electrodes spaced at intervals along the rod. The rods are secured to four terminals which are isolated by only four insulators. This structure requires bias voltage to be supplied to only two terminals and eliminates the need for individual electrode bias and insulators, as well as increases life by eliminating beam plating of insulators.

Inventors:

Brodowski, John ^[1]

Smithtown, NY

Issue Date:: 1982-11-23

Research Org.:: Associated Universities, Inc., Upton, NY (United States)

OSTI Identifier:: 864413

Patent Number(s):: 4360760

Application Number:: 06/179,918

Assignee:: United States of America as represented by United States (Washington, DC)

Patent Classifications (CPCs):: H - ELECTRICITY H01 - BASIC ELECTRIC ELEMENTS H01J - ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS

H - ELECTRICITY H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR H05H - PLASMA TECHNIQUE

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H - ELECTRICITY H01 - BASIC ELECTRIC ELEMENTS H01J - ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
H01J23/083 - Electrostatic focusing arrangements

H - ELECTRICITY H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR H05H - PLASMA TECHNIQUE
H05H7/18 - Cavities

G - PHYSICS G21 - NUCLEAR PHYSICS G21K - TECHNIQUES FOR HANDLING PARTICLES OR IONISING RADIATION NOT OTHERWISE PROVIDED FOR
G21K1/087 - by electrical means

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DOE Contract Number:: AC02-76CH00016

Resource Type:: Patent

Country of Publication:: United States

Language:: English

Subject:: electrostatic; quadrupole; array; focusing; parallel; beams; charged; particles; quadrupoles; capable; providing; strong; simultaneously; multiple; easily; fabricated; single; element; comprising; support; rod; electrodes; spaced; intervals; rods; secured; terminals; isolated; insulators; structure; requires; bias; voltage; supplied; eliminates; individual; electrode; increases; life; eliminating; beam; plating; support rod; parallel beams; multiple electrodes; pole array; charged particles; charged particle; bias voltage; multiple electrode; providing strong; multiple beams; electrostatic quadrupole; element comprising; electrostatic quadrupoles; dual electrode; electrodes spaced; electrostatic focusing; multiple beam; quadrupole array; array element; easily fabricated; /315/250/313/976/

Citation Formats


                    Brodowski, John. Electrostatic quadrupole array for focusing parallel beams of charged particles.  United States: N. p., 1982. 
        Web.

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                    Brodowski, John. Electrostatic quadrupole array for focusing parallel beams of charged particles.  United States.

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                    Brodowski, John. Tue .  
        "Electrostatic quadrupole array for focusing parallel beams of charged particles".  United States.  https://www.osti.gov/servlets/purl/864413.

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@article{osti_864413,

  title        = {Electrostatic quadrupole array for focusing parallel beams of charged particles},

  author       = {Brodowski, John},

  abstractNote = {An array of electrostatic quadrupoles, capable of providing strong electrostatic focusing simultaneously on multiple beams, is easily fabricated from a single array element comprising a support rod and multiple electrodes spaced at intervals along the rod. The rods are secured to four terminals which are isolated by only four insulators. This structure requires bias voltage to be supplied to only two terminals and eliminates the need for individual electrode bias and insulators, as well as increases life by eliminating beam plating of insulators.},

  doi          = {},

  journal      = {},
number       = ,

  volume       = ,

  place        = {United States},

  year         = {1982},

  month        = {11}

}

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