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Title: Chemical vapor deposition of sialon

Abstract

A laminated composite and a method for forming the composite by chemical vapor deposition. The composite includes a layer of sialon and a material to which the layer is bonded. The method includes the steps of exposing a surface of the material to an ammonia containing atmosphere; heating the surface to at least about 1200.degree. C.; and impinging a gas containing in a flowing atmosphere of air N.sub.2, SiCl.sub.4, and AlCl.sub.3 on the surface.

Inventors:
 [1];  [1]
  1. Livermore, CA
Issue Date:
Research Org.:
Lawrence Livermore National Lab. (LLNL), Livermore, CA (United States)
OSTI Identifier:
864253
Patent Number(s):
4336304
Assignee:
United States of America as represented by United States (Washington, DC)
Patent Classifications (CPCs):
C - CHEMISTRY C04 - CEMENTS C04B - LIME, MAGNESIA
Y - NEW / CROSS SECTIONAL TECHNOLOGIES Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC Y10T - TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
Resource Type:
Patent
Country of Publication:
United States
Language:
English
Subject:
chemical; vapor; deposition; sialon; laminated; composite; method; forming; layer; material; bonded; steps; exposing; surface; ammonia; containing; atmosphere; heating; 1200; degree; impinging; gas; flowing; air; sicl; alcl; laminated composite; gas containing; chemical vapor; vapor deposition; containing atmosphere; /428/219/427/501/

Citation Formats

Landingham, Richard L, and Casey, Alton W. Chemical vapor deposition of sialon. United States: N. p., 1982. Web.
Landingham, Richard L, & Casey, Alton W. Chemical vapor deposition of sialon. United States.
Landingham, Richard L, and Casey, Alton W. Fri . "Chemical vapor deposition of sialon". United States. https://www.osti.gov/servlets/purl/864253.
@article{osti_864253,
title = {Chemical vapor deposition of sialon},
author = {Landingham, Richard L and Casey, Alton W},
abstractNote = {A laminated composite and a method for forming the composite by chemical vapor deposition. The composite includes a layer of sialon and a material to which the layer is bonded. The method includes the steps of exposing a surface of the material to an ammonia containing atmosphere; heating the surface to at least about 1200.degree. C.; and impinging a gas containing in a flowing atmosphere of air N.sub.2, SiCl.sub.4, and AlCl.sub.3 on the surface.},
doi = {},
journal = {},
number = ,
volume = ,
place = {United States},
year = {1982},
month = {1}
}