Transparent electrical conducting films by activated reactive evaporation

Bunshah, Rointan; Nath, Prem

Title: Transparent electrical conducting films by activated reactive evaporation

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Abstract

Process and apparatus for producing transparent electrical conducting thin films by activated reactive evaporation. Thin films of low melting point metals and alloys, such as indium oxide and indium oxide doped with tin, are produced by physical vapor deposition. The metal or alloy is vaporized by electrical resistance heating in a vacuum chamber, oxygen and an inert gas such as argon are introduced into the chamber, and vapor and gas are ionized by a beam of low energy electrons in a reaction zone between the resistance heater and the substrate. There is a reaction between the ionized oxygen and the metal vapor resulting in the metal oxide which deposits on the substrate as a thin film which is ready for use without requiring post deposition heat treatment.

Inventors:: Bunshah, Rointan; Nath, Prem

Issue Date:: 1982-01-01

Research Org.:: Univ. of California, Berkeley, CA (United States)

Sponsoring Org.:: USDOE

OSTI Identifier:: 864251

Patent Number(s):: 4336277

Application Number:: 06/191,407

Assignee:: Regents of University of California (Berkeley, CA)

Patent Classifications (CPCs):: C - CHEMISTRY C03 - GLASS C03C - CHEMICAL COMPOSITION OF GLASSES, GLAZES, OR VITREOUS ENAMELS

Y - NEW / CROSS SECTIONAL TECHNOLOGIES Y02 - TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE Y02E - REDUCTION OF GREENHOUSE GAS [GHG] EMISSIONS, RELATED TO ENERGY GENERATION, TRANSMISSION OR DISTRIBUTION

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C - CHEMISTRY C03 - GLASS C03C - CHEMICAL COMPOSITION OF GLASSES, GLAZES, OR VITREOUS ENAMELS
C03C2218/152 - by cvd

Y - NEW / CROSS SECTIONAL TECHNOLOGIES Y02 - TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE Y02E - REDUCTION OF GREENHOUSE GAS [GHG] EMISSIONS, RELATED TO ENERGY GENERATION, TRANSMISSION OR DISTRIBUTION
Y02E10/50 - Photovoltaic [PV] energy

C - CHEMISTRY C03 - GLASS C03C - CHEMICAL COMPOSITION OF GLASSES, GLAZES, OR VITREOUS ENAMELS
C03C2217/231 - In2O3/SnO2

H - ELECTRICITY H01 - BASIC ELECTRIC ELEMENTS H01L - SEMICONDUCTOR DEVICES
H01L31/1884 - {Manufacture of transparent electrodes, e.g. TCO, ITO}

C - CHEMISTRY C23 - COATING METALLIC MATERIAL C23C - COATING METALLIC MATERIAL
C23C14/0021 - {Reactive sputtering or evaporation}

C - CHEMISTRY C03 - GLASS C03C - CHEMICAL COMPOSITION OF GLASSES, GLAZES, OR VITREOUS ENAMELS
C03C2217/215 - In2O3
C03C2218/15 - from the vapour phase

C - CHEMISTRY C23 - COATING METALLIC MATERIAL C23C - COATING METALLIC MATERIAL
C23C14/32 - by explosion

C - CHEMISTRY C03 - GLASS C03C - CHEMICAL COMPOSITION OF GLASSES, GLAZES, OR VITREOUS ENAMELS
C03C17/245 - by deposition from the vapour phase

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DOE Contract Number:: AC04-79ET23008

Resource Type:: Patent

Resource Relation:: Patent File Date: 1980 Sep 29

Country of Publication:: United States

Language:: English

Subject:: transparent; electrical; conducting; films; activated; reactive; evaporation; process; apparatus; producing; melting; metals; alloys; indium; oxide; doped; produced; physical; vapor; deposition; metal; alloy; vaporized; resistance; heating; vacuum; chamber; oxygen; inert; gas; argon; introduced; ionized; beam; energy; electrons; reaction; zone; heater; substrate; resulting; deposits; film; requiring; post; heat; treatment; transparent electrical; electrical conducting; energy electrons; resistance heating; indium oxide; metal vapor; vacuum chamber; metal oxide; inert gas; reaction zone; vapor deposition; electrical resistance; heat treatment; physical vapor; energy electron; oxide doped; reactive evaporation; vapor resulting; conducting films; evaporation process; conducting film; resistance heat; resistance heater; activated reactive; /427/118/204/

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                    Bunshah, Rointan, and Nath, Prem. Transparent electrical conducting films by activated reactive evaporation.  United States: N. p., 1982. 
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                    Bunshah, Rointan, & Nath, Prem. Transparent electrical conducting films by activated reactive evaporation.  United States.

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                    Bunshah, Rointan, and Nath, Prem. Fri .  
        "Transparent electrical conducting films by activated reactive evaporation".  United States.  https://www.osti.gov/servlets/purl/864251.

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@article{osti_864251,

  title        = {Transparent electrical conducting films by activated reactive evaporation},

  author       = {Bunshah, Rointan and Nath, Prem},

  abstractNote = {Process and apparatus for producing transparent electrical conducting thin films by activated reactive evaporation. Thin films of low melting point metals and alloys, such as indium oxide and indium oxide doped with tin, are produced by physical vapor deposition. The metal or alloy is vaporized by electrical resistance heating in a vacuum chamber, oxygen and an inert gas such as argon are introduced into the chamber, and vapor and gas are ionized by a beam of low energy electrons in a reaction zone between the resistance heater and the substrate. There is a reaction between the ionized oxygen and the metal vapor resulting in the metal oxide which deposits on the substrate as a thin film which is ready for use without requiring post deposition heat treatment.},

  doi          = {},

  journal      = {},
number       = ,

  volume       = ,

  place        = {United States},

  year         = {1982},

  month        = {1}

}

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