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Title: XeCl Avalanche discharge laser employing Ar as a diluent

Abstract

A XeCl avalanche discharge exciplex laser which uses a gaseous lasing starting mixture of: (0.2%-0.4% chlorine donor/2.5%-10% Xe/97.3%-89.6% Ar). The chlorine donor normally comprises HCl but can also comprise CCl.sub.4 BCl.sub.3. Use of Ar as a diluent gas reduces operating pressures over other rare gas halide lasers to near atmospheric pressure, increases output lasing power of the XeCl avalanche discharge laser by 30% to exceed KrF avalanche discharge lasing outputs, and is less expensive to operate.

Inventors:
 [1]
  1. Santa Fe, NM
Issue Date:
Research Org.:
Los Alamos National Laboratory (LANL), Los Alamos, NM (United States)
OSTI Identifier:
864048
Patent Number(s):
4301425
Assignee:
United States of America as represented by United States (Washington, DC)
Patent Classifications (CPCs):
H - ELECTRICITY H01 - BASIC ELECTRIC ELEMENTS H01S - DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT
Resource Type:
Patent
Country of Publication:
United States
Language:
English
Subject:
xecl; avalanche; discharge; laser; employing; diluent; exciplex; gaseous; lasing; starting; mixture; -0; chlorine; donor; -10; xe; 97; -89; normally; comprises; hcl; comprise; ccl; bcl; gas; reduces; operating; pressures; rare; halide; lasers; near; atmospheric; pressure; increases; output; power; 30; exceed; krf; outputs; expensive; operate; operating pressure; rare gas; operating pressures; atmospheric pressure; discharge laser; xecl avalanche; avalanche discharge; chlorine donor; near atmospheric; diluent gas; gas halide; gaseous lasing; /372/

Citation Formats

Sze, Robert C. XeCl Avalanche discharge laser employing Ar as a diluent. United States: N. p., 1981. Web.
Sze, Robert C. XeCl Avalanche discharge laser employing Ar as a diluent. United States.
Sze, Robert C. Thu . "XeCl Avalanche discharge laser employing Ar as a diluent". United States. https://www.osti.gov/servlets/purl/864048.
@article{osti_864048,
title = {XeCl Avalanche discharge laser employing Ar as a diluent},
author = {Sze, Robert C},
abstractNote = {A XeCl avalanche discharge exciplex laser which uses a gaseous lasing starting mixture of: (0.2%-0.4% chlorine donor/2.5%-10% Xe/97.3%-89.6% Ar). The chlorine donor normally comprises HCl but can also comprise CCl.sub.4 BCl.sub.3. Use of Ar as a diluent gas reduces operating pressures over other rare gas halide lasers to near atmospheric pressure, increases output lasing power of the XeCl avalanche discharge laser by 30% to exceed KrF avalanche discharge lasing outputs, and is less expensive to operate.},
doi = {},
journal = {},
number = ,
volume = ,
place = {United States},
year = {Thu Jan 01 00:00:00 EST 1981},
month = {Thu Jan 01 00:00:00 EST 1981}
}