High energy XeBr electric discharge laser
Abstract
A high energy XeBr laser for producing coherent radiation at 282 nm. The XeBr laser utilizes an electric discharge as the excitation source to minimize formation of molecular ions thereby minimizing absorption of laser radiation by the active medium. Additionally, HBr is used as the halogen donor which undergoes harpooning reactions with Xe.sub.M * to form XeBr*.
- Inventors:
-
- Santa Fe, NM
- Los Alamos, NM
- Issue Date:
- Research Org.:
- Los Alamos National Lab. (LANL), Los Alamos, NM (United States)
- OSTI Identifier:
- 863847
- Patent Number(s):
- 4259645
- Assignee:
- United States of America as represented by United States (Washington, DC)
- Patent Classifications (CPCs):
-
H - ELECTRICITY H01 - BASIC ELECTRIC ELEMENTS H01S - DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT
- Resource Type:
- Patent
- Country of Publication:
- United States
- Language:
- English
- Subject:
- energy; xebr; electric; discharge; laser; producing; coherent; radiation; 282; nm; utilizes; excitation; source; minimize; formation; molecular; minimizing; absorption; active; medium; additionally; hbr; halogen; donor; undergoes; harpooning; reactions; xe; form; excitation source; producing coherent; coherent radiation; laser radiation; electric discharge; discharge laser; active medium; laser utilizes; xebr laser; minimizing absorption; minimize formation; energy xebr; /372/
Citation Formats
Sze, Robert C, and Scott, Peter B. High energy XeBr electric discharge laser. United States: N. p., 1981.
Web.
Sze, Robert C, & Scott, Peter B. High energy XeBr electric discharge laser. United States.
Sze, Robert C, and Scott, Peter B. Thu .
"High energy XeBr electric discharge laser". United States. https://www.osti.gov/servlets/purl/863847.
@article{osti_863847,
title = {High energy XeBr electric discharge laser},
author = {Sze, Robert C and Scott, Peter B},
abstractNote = {A high energy XeBr laser for producing coherent radiation at 282 nm. The XeBr laser utilizes an electric discharge as the excitation source to minimize formation of molecular ions thereby minimizing absorption of laser radiation by the active medium. Additionally, HBr is used as the halogen donor which undergoes harpooning reactions with Xe.sub.M * to form XeBr*.},
doi = {},
journal = {},
number = ,
volume = ,
place = {United States},
year = {1981},
month = {1}
}