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Title: Control of impurities in toroidal plasma devices

Abstract

A method and apparatus for plasma impurity control in closed flux plasma systems such as Tokamak reactors is disclosed. Local axisymmetrical injection of hydrogen gas is employed to reverse the normally inward flow of impurities into the plasma.

Inventors:
 [1]
  1. (La Jolla, CA)
Issue Date:
Research Org.:
General Atomic Co., San Diego, Calif.
OSTI Identifier:
863747
Patent Number(s):
4239594
Assignee:
United States of America as represented by United States (Washington, DC) OSTI
DOE Contract Number:  
EY-76-C-03-0167
Resource Type:
Patent
Country of Publication:
United States
Language:
English
Subject:
control; impurities; toroidal; plasma; devices; method; apparatus; impurity; closed; flux; systems; tokamak; reactors; disclosed; local; axisymmetrical; injection; hydrogen; gas; employed; reverse; normally; inward; flow; plasma devices; toroidal plasma; hydrogen gas; plasma device; impurity control; plasma systems; /376/173/

Citation Formats

Ohkawa, Tihiro. Control of impurities in toroidal plasma devices. United States: N. p., 1980. Web.
Ohkawa, Tihiro. Control of impurities in toroidal plasma devices. United States.
Ohkawa, Tihiro. Tue . "Control of impurities in toroidal plasma devices". United States. https://www.osti.gov/servlets/purl/863747.
@article{osti_863747,
title = {Control of impurities in toroidal plasma devices},
author = {Ohkawa, Tihiro},
abstractNote = {A method and apparatus for plasma impurity control in closed flux plasma systems such as Tokamak reactors is disclosed. Local axisymmetrical injection of hydrogen gas is employed to reverse the normally inward flow of impurities into the plasma.},
doi = {},
journal = {},
number = ,
volume = ,
place = {United States},
year = {1980},
month = {1}
}

Patent:

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