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Title: Sputter target

Abstract

The disclosure relates to an improved sputter target for use in the deposition of hard coatings. An exemplary target is given wherein titanium diboride is brazed to a tantalum backing plate using a gold-palladium-nickel braze alloy.

Inventors:
 [1];  [2]
  1. (Kansas City, MO)
  2. (Overland Park, KS)
Issue Date:
Research Org.:
Bendix Corp., Kansas City, MO (USA)
OSTI Identifier:
863599
Patent Number(s):
4209375
Assignee:
United States of America as represented by United States (Washington, DC) OSTI
DOE Contract Number:  
EY-76-C-04-0613
Resource Type:
Patent
Country of Publication:
United States
Language:
English
Subject:
sputter; target; disclosure; relates; improved; deposition; hard; coatings; exemplary; titanium; diboride; brazed; tantalum; plate; gold-palladium-nickel; braze; alloy; braze alloy; titanium diboride; disclosure relates; sputter target; hard coatings; hard coating; /204/428/

Citation Formats

Gates, Willard G., and Hale, Gerald J. Sputter target. United States: N. p., 1980. Web.
Gates, Willard G., & Hale, Gerald J. Sputter target. United States.
Gates, Willard G., and Hale, Gerald J. Tue . "Sputter target". United States. https://www.osti.gov/servlets/purl/863599.
@article{osti_863599,
title = {Sputter target},
author = {Gates, Willard G. and Hale, Gerald J.},
abstractNote = {The disclosure relates to an improved sputter target for use in the deposition of hard coatings. An exemplary target is given wherein titanium diboride is brazed to a tantalum backing plate using a gold-palladium-nickel braze alloy.},
doi = {},
journal = {},
number = ,
volume = ,
place = {United States},
year = {1980},
month = {1}
}

Patent:

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