Sputter target
Abstract
The disclosure relates to an improved sputter target for use in the deposition of hard coatings. An exemplary target is given wherein titanium diboride is brazed to a tantalum backing plate using a gold-palladium-nickel braze alloy.
- Inventors:
-
- Kansas City, MO
- Overland Park, KS
- Issue Date:
- Research Org.:
- Bendix Corp., Kansas City, MO (United States)
- OSTI Identifier:
- 863599
- Patent Number(s):
- 4209375
- Assignee:
- United States of America as represented by United States (Washington, DC)
- Patent Classifications (CPCs):
-
B - PERFORMING OPERATIONS B23 - MACHINE TOOLS B23K - SOLDERING OR UNSOLDERING
C - CHEMISTRY C23 - COATING METALLIC MATERIAL C23C - COATING METALLIC MATERIAL
- DOE Contract Number:
- EY-76-C-04-0613
- Resource Type:
- Patent
- Country of Publication:
- United States
- Language:
- English
- Subject:
- sputter; target; disclosure; relates; improved; deposition; hard; coatings; exemplary; titanium; diboride; brazed; tantalum; plate; gold-palladium-nickel; braze; alloy; braze alloy; titanium diboride; disclosure relates; sputter target; hard coatings; hard coating; /204/428/
Citation Formats
Gates, Willard G, and Hale, Gerald J. Sputter target. United States: N. p., 1980.
Web.
Gates, Willard G, & Hale, Gerald J. Sputter target. United States.
Gates, Willard G, and Hale, Gerald J. Tue .
"Sputter target". United States. https://www.osti.gov/servlets/purl/863599.
@article{osti_863599,
title = {Sputter target},
author = {Gates, Willard G and Hale, Gerald J},
abstractNote = {The disclosure relates to an improved sputter target for use in the deposition of hard coatings. An exemplary target is given wherein titanium diboride is brazed to a tantalum backing plate using a gold-palladium-nickel braze alloy.},
doi = {},
journal = {},
number = ,
volume = ,
place = {United States},
year = {1980},
month = {1}
}
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