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Title: Purification of silane via laser-induced chemistry

Abstract

Impurities such as PH.sub.3, AsH.sub.3, and B.sub.2 H.sub.6 may be removed from SiH.sub.4 by means of selective photolysis with ultraviolet radiation of the appropriate wavelength. An ArF laser operating at 193 nm provides an efficient and effective radiation source for the photolysis.

Inventors:
 [1];  [1]
  1. Los Alamos, NM
Issue Date:
Research Org.:
Oak Ridge National Lab. (ORNL), Oak Ridge, TN (United States)
OSTI Identifier:
863316
Patent Number(s):
4146449
Assignee:
United States of America as represented by United States (Washington, DC)
Patent Classifications (CPCs):
C - CHEMISTRY C01 - INORGANIC CHEMISTRY C01B - NON-METALLIC ELEMENTS
B - PERFORMING OPERATIONS B01 - PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL B01J - CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY
DOE Contract Number:  
W-7405-ENG-26
Resource Type:
Patent
Country of Publication:
United States
Language:
English
Subject:
purification; silane; via; laser-induced; chemistry; impurities; ph; ash; removed; sih; means; selective; photolysis; ultraviolet; radiation; appropriate; wavelength; arf; laser; operating; 193; nm; provides; efficient; effective; source; ultraviolet radiation; radiation source; appropriate wavelength; arf laser; laser operating; via laser; /204/

Citation Formats

Clark, John H, and Anderson, Robert G. Purification of silane via laser-induced chemistry. United States: N. p., 1979. Web.
Clark, John H, & Anderson, Robert G. Purification of silane via laser-induced chemistry. United States.
Clark, John H, and Anderson, Robert G. Mon . "Purification of silane via laser-induced chemistry". United States. https://www.osti.gov/servlets/purl/863316.
@article{osti_863316,
title = {Purification of silane via laser-induced chemistry},
author = {Clark, John H and Anderson, Robert G},
abstractNote = {Impurities such as PH.sub.3, AsH.sub.3, and B.sub.2 H.sub.6 may be removed from SiH.sub.4 by means of selective photolysis with ultraviolet radiation of the appropriate wavelength. An ArF laser operating at 193 nm provides an efficient and effective radiation source for the photolysis.},
doi = {},
journal = {},
number = ,
volume = ,
place = {United States},
year = {1979},
month = {1}
}

Patent:

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