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Title: Cesium injection system for negative ion duoplasmatrons

Abstract

Longitudinally extending, foraminous cartridge means having a cylindrical side wall forming one flat, circular, tip end surface and an opposite end; an open-ended cavity, and uniformly spaced orifices for venting the cavity through the side wall in the annulus of a plasma ring for uniformly ejecting cesium for coating the flat, circular, surface. To this end, the cavity is filled with a cesium containing substance and attached to a heater in a hollow-discharge duoplasmatron. By coating the flat circular surface with a uniform monolayer of cesium and locating it in an electrical potential well at the end of a hollow-discharge, ion duoplasmatron source of an annular hydrogen plasma ring, the negative hydrogen production from the duoplasmatron is increased. The negative hydrogen is produced on the flat surface of the cartridge and extracted by the electrical potential well along a trajectory coaxial with the axis of the plasma ring.

Inventors:
 [1];  [2];  [3]
  1. Oho, JA
  2. Setauket, NY
  3. East Patchogue, NY
Issue Date:
Research Org.:
Brookhaven National Lab. (BNL), Upton, NY (United States)
OSTI Identifier:
863105
Patent Number(s):
4093858
Assignee:
United States of America as represented by United States (Washington, DC)
Patent Classifications (CPCs):
H - ELECTRICITY H01 - BASIC ELECTRIC ELEMENTS H01J - ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
DOE Contract Number:  
AT(30-1)-16
Resource Type:
Patent
Country of Publication:
United States
Language:
English
Subject:
cesium; injection; negative; duoplasmatrons; longitudinally; extending; foraminous; cartridge; means; cylindrical; wall; forming; flat; circular; tip; surface; opposite; open-ended; cavity; uniformly; spaced; orifices; venting; annulus; plasma; ejecting; coating; filled; containing; substance; attached; heater; hollow-discharge; duoplasmatron; uniform; monolayer; locating; electrical; potential; source; annular; hydrogen; production; increased; produced; extracted; trajectory; coaxial; axis; negative hydrogen; uniformly spaced; containing substance; wall forming; electrical potential; longitudinally extending; hydrogen production; flat surface; wall form; /250/

Citation Formats

Kobayashi, Maasaki, Prelec, Krsto, and Sluyters, Theodorus J. Cesium injection system for negative ion duoplasmatrons. United States: N. p., 1978. Web.
Kobayashi, Maasaki, Prelec, Krsto, & Sluyters, Theodorus J. Cesium injection system for negative ion duoplasmatrons. United States.
Kobayashi, Maasaki, Prelec, Krsto, and Sluyters, Theodorus J. Sun . "Cesium injection system for negative ion duoplasmatrons". United States. https://www.osti.gov/servlets/purl/863105.
@article{osti_863105,
title = {Cesium injection system for negative ion duoplasmatrons},
author = {Kobayashi, Maasaki and Prelec, Krsto and Sluyters, Theodorus J},
abstractNote = {Longitudinally extending, foraminous cartridge means having a cylindrical side wall forming one flat, circular, tip end surface and an opposite end; an open-ended cavity, and uniformly spaced orifices for venting the cavity through the side wall in the annulus of a plasma ring for uniformly ejecting cesium for coating the flat, circular, surface. To this end, the cavity is filled with a cesium containing substance and attached to a heater in a hollow-discharge duoplasmatron. By coating the flat circular surface with a uniform monolayer of cesium and locating it in an electrical potential well at the end of a hollow-discharge, ion duoplasmatron source of an annular hydrogen plasma ring, the negative hydrogen production from the duoplasmatron is increased. The negative hydrogen is produced on the flat surface of the cartridge and extracted by the electrical potential well along a trajectory coaxial with the axis of the plasma ring.},
doi = {},
journal = {},
number = ,
volume = ,
place = {United States},
year = {1978},
month = {1}
}

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