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Title: Method and apparatus for reducing diffraction-induced damage in high power laser amplifier systems

Abstract

Self-focusing damage caused by diffraction in laser amplifier systems may be minimized by appropriately tailoring the input optical beam profile by passing the beam through an aperture having a uniform high optical transmission within a particular radius r.sub.o and a transmission which drops gradually to a low value at greater radii. Apertures having the desired transmission characteristics may readily be manufactured by exposing high resolution photographic films and plates to a diffuse, disk-shaped light source and mask arrangement.

Inventors:
 [1];  [1];  [1];  [2]
  1. Los Alamos, NM
  2. (Los Alamos, NM)
Issue Date:
Research Org.:
Los Alamos National Lab. (LANL), Los Alamos, NM (United States)
OSTI Identifier:
862458
Patent Number(s):
3935545
Assignee:
United States of America as represented by United States Energy (Washington, DC)
Patent Classifications (CPCs):
G - PHYSICS G02 - OPTICS G02B - OPTICAL ELEMENTS, SYSTEMS, OR APPARATUS
H - ELECTRICITY H01 - BASIC ELECTRIC ELEMENTS H01S - DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT
DOE Contract Number:  
W-7405-ENG-36
Resource Type:
Patent
Country of Publication:
United States
Language:
English
Subject:
method; apparatus; reducing; diffraction-induced; damage; power; laser; amplifier; systems; self-focusing; caused; diffraction; minimized; appropriately; tailoring; input; optical; beam; profile; passing; aperture; uniform; transmission; particular; radius; drops; gradually; value; radii; apertures; desired; characteristics; readily; manufactured; exposing; resolution; photographic; films; plates; diffuse; disk-shaped; light; source; mask; arrangement; transmission characteristics; optical transmission; optical beam; light source; laser amplifier; power laser; damage caused; beam profile; photographic film; input optical; solution ph; amplifier systems; /372/359/

Citation Formats

Campillo, Anthony J, Newnam, Brian E, Shapiro, Stanley L, and Terrell, Jr., N. James. Method and apparatus for reducing diffraction-induced damage in high power laser amplifier systems. United States: N. p., 1976. Web.
Campillo, Anthony J, Newnam, Brian E, Shapiro, Stanley L, & Terrell, Jr., N. James. Method and apparatus for reducing diffraction-induced damage in high power laser amplifier systems. United States.
Campillo, Anthony J, Newnam, Brian E, Shapiro, Stanley L, and Terrell, Jr., N. James. Thu . "Method and apparatus for reducing diffraction-induced damage in high power laser amplifier systems". United States. https://www.osti.gov/servlets/purl/862458.
@article{osti_862458,
title = {Method and apparatus for reducing diffraction-induced damage in high power laser amplifier systems},
author = {Campillo, Anthony J and Newnam, Brian E and Shapiro, Stanley L and Terrell, Jr., N. James},
abstractNote = {Self-focusing damage caused by diffraction in laser amplifier systems may be minimized by appropriately tailoring the input optical beam profile by passing the beam through an aperture having a uniform high optical transmission within a particular radius r.sub.o and a transmission which drops gradually to a low value at greater radii. Apertures having the desired transmission characteristics may readily be manufactured by exposing high resolution photographic films and plates to a diffuse, disk-shaped light source and mask arrangement.},
doi = {},
journal = {},
number = ,
volume = ,
place = {United States},
year = {1976},
month = {1}
}

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