Method and apparatus for reducing diffraction-induced damage in high power laser amplifier systems

Title: Method and apparatus for reducing diffraction-induced damage in high power laser amplifier systems

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Abstract

Self-focusing damage caused by diffraction in laser amplifier systems may be minimized by appropriately tailoring the input optical beam profile by passing the beam through an aperture having a uniform high optical transmission within a particular radius r.sub.o and a transmission which drops gradually to a low value at greater radii. Apertures having the desired transmission characteristics may readily be manufactured by exposing high resolution photographic films and plates to a diffuse, disk-shaped light source and mask arrangement.

Inventors:

Campillo, Anthony J ^[1]; Newnam, Brian E ^[1]; Shapiro, Stanley L ^[1]; Terrell, Jr., N. James ^[2]

Los Alamos, NM
(Los Alamos, NM)

Issue Date:: 1976-01-01

Research Org.:: Los Alamos National Lab. (LANL), Los Alamos, NM (United States)

OSTI Identifier:: 862458

Patent Number(s):: 3935545

Assignee:: United States of America as represented by United States Energy (Washington, DC)

Patent Classifications (CPCs):: G - PHYSICS G02 - OPTICS G02B - OPTICAL ELEMENTS, SYSTEMS, OR APPARATUS

H - ELECTRICITY H01 - BASIC ELECTRIC ELEMENTS H01S - DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT

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G - PHYSICS G02 - OPTICS G02B - OPTICAL ELEMENTS, SYSTEMS, OR APPARATUS
G02B27/58 - Optics for apodization or superresolution

H - ELECTRICITY H01 - BASIC ELECTRIC ELEMENTS H01S - DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT
H01S3/005 - {Optical devices external to the laser cavity, specially adapted for lasers, e.g. for homogenisation of the beam or for manipulating laser pulses, e.g. pulse shaping

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DOE Contract Number:: W-7405-ENG-36

Resource Type:: Patent

Country of Publication:: United States

Language:: English

Subject:: method; apparatus; reducing; diffraction-induced; damage; power; laser; amplifier; systems; self-focusing; caused; diffraction; minimized; appropriately; tailoring; input; optical; beam; profile; passing; aperture; uniform; transmission; particular; radius; drops; gradually; value; radii; apertures; desired; characteristics; readily; manufactured; exposing; resolution; photographic; films; plates; diffuse; disk-shaped; light; source; mask; arrangement; transmission characteristics; optical transmission; optical beam; light source; laser amplifier; power laser; damage caused; beam profile; photographic film; input optical; solution ph; amplifier systems; /372/359/

Citation Formats


                    Campillo, Anthony J, Newnam, Brian E, Shapiro, Stanley L, and Terrell, Jr., N. James. Method and apparatus for reducing diffraction-induced damage in high power laser amplifier systems.  United States: N. p., 1976. 
        Web.

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                    Campillo, Anthony J, Newnam, Brian E, Shapiro, Stanley L, & Terrell, Jr., N. James. Method and apparatus for reducing diffraction-induced damage in high power laser amplifier systems.  United States.

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                    Campillo, Anthony J, Newnam, Brian E, Shapiro, Stanley L, and Terrell, Jr., N. James. Thu .  
        "Method and apparatus for reducing diffraction-induced damage in high power laser amplifier systems".  United States.  https://www.osti.gov/servlets/purl/862458.

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@article{osti_862458,

  title        = {Method and apparatus for reducing diffraction-induced damage in high power laser amplifier systems},

  author       = {Campillo, Anthony J and Newnam, Brian E and Shapiro, Stanley L and Terrell, Jr., N. James},

  abstractNote = {Self-focusing damage caused by diffraction in laser amplifier systems may be minimized by appropriately tailoring the input optical beam profile by passing the beam through an aperture having a uniform high optical transmission within a particular radius r.sub.o and a transmission which drops gradually to a low value at greater radii. Apertures having the desired transmission characteristics may readily be manufactured by exposing high resolution photographic films and plates to a diffuse, disk-shaped light source and mask arrangement.},

  doi          = {},

  journal      = {},
number       = ,

  volume       = ,

  place        = {United States},

  year         = {1976},

  month        = {1}

}

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