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Title: Method and apparatus for spatially uniform electropolishing and electrolytic etching

Abstract

In an electropolishing or electrolytic etching apparatus the anode is separated from the cathode to prevent bubble transport to the anode and to produce a uniform current distribution at the anode by means of a solid nonconducting anode-cathode barrier. The anode extends into the top of the barrier and the cathode is outside the barrier. A virtual cathode hole formed in the bottom of the barrier below the level of the cathode permits current flow while preventing bubble transport. The anode is rotatable and oriented horizontally facing down. An extended anode is formed by mounting the workpiece in a holder which extends the electropolishing or etching area beyond the edge of the workpiece to reduce edge effects at the workpiece. A reference electrode controls cell voltage. Endpoint detection and current shut-off stop polishing. Spatially uniform polishing or etching can be rapidly performed. 6 figs.

Inventors:
; ;
Issue Date:
OSTI Identifier:
7274486
Patent Number(s):
5096550 A
Application Number:
PPN: US 7-597225
Assignee:
Dept. of Energy, Washington, DC (United States) PTO; EDB-94-081551
DOE Contract Number:  
W-7405-ENG-48
Resource Type:
Patent
Resource Relation:
Patent File Date: 15 Oct 1990
Country of Publication:
United States
Language:
English
Subject:
36 MATERIALS SCIENCE; EQUIPMENT; DESIGN; MATERIALS; ELECTROPOLISHING; ETCHING; ELECTRIC CURRENTS; PROCESS CONTROL; CONTROL; CURRENTS; ELECTROLYSIS; LYSIS; POLISHING; SURFACE FINISHING; 360101* - Metals & Alloys- Preparation & Fabrication; 360201 - Ceramics, Cermets, & Refractories- Preparation & Fabrication; 360601 - Other Materials- Preparation & Manufacture

Citation Formats

Mayer, S.T., Contolini, R.J., and Bernhardt, A.F. Method and apparatus for spatially uniform electropolishing and electrolytic etching. United States: N. p., 1992. Web.
Mayer, S.T., Contolini, R.J., & Bernhardt, A.F. Method and apparatus for spatially uniform electropolishing and electrolytic etching. United States.
Mayer, S.T., Contolini, R.J., and Bernhardt, A.F. Tue . "Method and apparatus for spatially uniform electropolishing and electrolytic etching". United States.
@article{osti_7274486,
title = {Method and apparatus for spatially uniform electropolishing and electrolytic etching},
author = {Mayer, S.T. and Contolini, R.J. and Bernhardt, A.F.},
abstractNote = {In an electropolishing or electrolytic etching apparatus the anode is separated from the cathode to prevent bubble transport to the anode and to produce a uniform current distribution at the anode by means of a solid nonconducting anode-cathode barrier. The anode extends into the top of the barrier and the cathode is outside the barrier. A virtual cathode hole formed in the bottom of the barrier below the level of the cathode permits current flow while preventing bubble transport. The anode is rotatable and oriented horizontally facing down. An extended anode is formed by mounting the workpiece in a holder which extends the electropolishing or etching area beyond the edge of the workpiece to reduce edge effects at the workpiece. A reference electrode controls cell voltage. Endpoint detection and current shut-off stop polishing. Spatially uniform polishing or etching can be rapidly performed. 6 figs.},
doi = {},
journal = {},
number = ,
volume = ,
place = {United States},
year = {1992},
month = {3}
}