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Title: Method and apparatus for removing and preventing window deposition during photochemical vapor deposition (photo-CVD) processes

Abstract

Unwanted build-up of the film deposited on the transparent light-transmitting window of a photochemical vacuum deposition (photo-CVD) chamber is eliminated by flowing an etchant into the part of the photolysis region in the chamber immediately adjacent the window and remote from the substrate and from the process gas inlet. The respective flows of the etchant and the process gas are balanced to confine the etchant reaction to the part of the photolysis region proximate to the window and remote from the substrate. The etchant is preferably one that etches film deposit on the window, does not etch or affect the window itself, and does not produce reaction by-products that are deleterious to either the desired film deposited on the substrate or to the photolysis reaction adjacent the substrate. 3 figs.

Inventors:
;
Issue Date:
OSTI Identifier:
7268840
Patent Number(s):
4816294 A
Application Number:
PPN: US 7-045823
Assignee:
Midwest Research Inst., Kansas City, MO (United States) PTO; EDB-94-116250
DOE Contract Number:  
AC02-83CH10093
Resource Type:
Patent
Resource Relation:
Patent File Date: 4 May 1987
Country of Publication:
United States
Language:
English
Subject:
36 MATERIALS SCIENCE; CHEMICAL REACTORS; WINDOWS; MATERIALS; CHEMICAL VAPOR DEPOSITION; CLEANING; ETCHING; SUBSTRATES; CHEMICAL COATING; DEPOSITION; OPENINGS; SURFACE COATING; SURFACE FINISHING; 360101* - Metals & Alloys- Preparation & Fabrication; 360201 - Ceramics, Cermets, & Refractories- Preparation & Fabrication; 360601 - Other Materials- Preparation & Manufacture

Citation Formats

Tsuo, S., and Langford, A.A. Method and apparatus for removing and preventing window deposition during photochemical vapor deposition (photo-CVD) processes. United States: N. p., 1989. Web.
Tsuo, S., & Langford, A.A. Method and apparatus for removing and preventing window deposition during photochemical vapor deposition (photo-CVD) processes. United States.
Tsuo, S., and Langford, A.A. Tue . "Method and apparatus for removing and preventing window deposition during photochemical vapor deposition (photo-CVD) processes". United States.
@article{osti_7268840,
title = {Method and apparatus for removing and preventing window deposition during photochemical vapor deposition (photo-CVD) processes},
author = {Tsuo, S. and Langford, A.A.},
abstractNote = {Unwanted build-up of the film deposited on the transparent light-transmitting window of a photochemical vacuum deposition (photo-CVD) chamber is eliminated by flowing an etchant into the part of the photolysis region in the chamber immediately adjacent the window and remote from the substrate and from the process gas inlet. The respective flows of the etchant and the process gas are balanced to confine the etchant reaction to the part of the photolysis region proximate to the window and remote from the substrate. The etchant is preferably one that etches film deposit on the window, does not etch or affect the window itself, and does not produce reaction by-products that are deleterious to either the desired film deposited on the substrate or to the photolysis reaction adjacent the substrate. 3 figs.},
doi = {},
journal = {},
number = ,
volume = ,
place = {United States},
year = {1989},
month = {3}
}