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Title: Intense steady state electron beam generator

Abstract

An intense, steady state, low emittance electron beam generator is formed by operating a hollow cathode discharge plasma source at critical levels in combination with an extraction electrode and a target electrode that are operable to extract a beam of fast primary electrons from the plasma source through a negatively biased grid that is critically operated to repel bulk electrons toward the plasma source while allowing the fast primary electrons to move toward the target in the desired beam that can be successfully transported for relatively large distances, such as one or more meters away from the plasma source. 2 figs.

Inventors:
; ;
Issue Date:
OSTI Identifier:
7264536
Patent Number(s):
4942339
Application Number:
PPN: US 7-249813
Assignee:
Dept. of Energy, Washington, DC (United States)
DOE Contract Number:  
AC02-76CH00016
Resource Type:
Patent
Resource Relation:
Patent File Date: 27 Sep 1988
Country of Publication:
United States
Language:
English
Subject:
71 CLASSICAL AND QUANTUM MECHANICS, GENERAL PHYSICS; Ta; ELECTRON BEAMS; BEAM PRODUCTION; BEAM EMITTANCE; BEAM TRANSPORT; ELECTRODES; PLASMA PRODUCTION; BEAMS; LEPTON BEAMS; PARTICLE BEAMS; 661220* - Particle Beam Production & Handling; Targets- (1992-)

Citation Formats

Hershcovitch, A, Kovarik, V J, and Prelec, K. Intense steady state electron beam generator. United States: N. p., 1990. Web.
Hershcovitch, A, Kovarik, V J, & Prelec, K. Intense steady state electron beam generator. United States.
Hershcovitch, A, Kovarik, V J, and Prelec, K. Tue . "Intense steady state electron beam generator". United States.
@article{osti_7264536,
title = {Intense steady state electron beam generator},
author = {Hershcovitch, A and Kovarik, V J and Prelec, K},
abstractNote = {An intense, steady state, low emittance electron beam generator is formed by operating a hollow cathode discharge plasma source at critical levels in combination with an extraction electrode and a target electrode that are operable to extract a beam of fast primary electrons from the plasma source through a negatively biased grid that is critically operated to repel bulk electrons toward the plasma source while allowing the fast primary electrons to move toward the target in the desired beam that can be successfully transported for relatively large distances, such as one or more meters away from the plasma source. 2 figs.},
doi = {},
journal = {},
number = ,
volume = ,
place = {United States},
year = {Tue Jul 17 00:00:00 EDT 1990},
month = {Tue Jul 17 00:00:00 EDT 1990}
}

Patent:
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