Method of chemical vapor deposition of boron nitride using polymeric cyanoborane

Title: Method of chemical vapor deposition of boron nitride using polymeric cyanoborane

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Polymeric cyanoborane is volatilized, decomposed by thermal or microwave plasma energy, and deposited on a substrate as an amorphous film containing boron, nitrogen and carbon. Residual carbon present in the film is removed by ammonia treatment at an increased temperature, producing an adherent, essentially stoichiometric boron nitride film. 11 figs.

Inventors:: Maya, L.

Issue Date:: 1994-06-14

OSTI Identifier:: 7198508

Assignee:: Martin Marietta Energy Systems, Inc., Oak Ridge, TN (United States) PTO; EDB-94-101804

Patent Number(s):: US 5320878; A

Application Number:: PPN: US 7-819688

Contract Number:: AC05-84OR21400

Resource Relation:: Patent File Date: 10 Jan 1992

Country of Publication:: United States

Language:: English

Subject:: 36 MATERIALS SCIENCE; BORON NITRIDES; CHEMICAL VAPOR DEPOSITION; AMORPHOUS STATE; CHEMICAL COMPOSITION; DECOMPOSITION; BORON COMPOUNDS; CHEMICAL COATING; CHEMICAL REACTIONS; DEPOSITION; NITRIDES; NITROGEN COMPOUNDS; PNICTIDES; SURFACE COATING; 360201* - Ceramics, Cermets, & Refractories- Preparation & Fabrication

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Method of chemical vapor deposition of boron nitride using polymeric cyanoborane

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