Boron hydride polymer coated substrates

Pearson, R K; Bystroff, R I; Miller, D E

Title: Boron hydride polymer coated substrates

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Abstract

A method is disclosed for coating a substrate with a uniformly smooth layer of a boron hydride polymer. The method comprises providing a reaction chamber which contains the substrate and the boron hydride plasma. A boron hydride feed stock is introduced into the chamber simultaneously with the generation of a plasma discharge within the chamber. A boron hydride plasma of ions, electrons and free radicals which is generated by the plasma discharge interacts to form a uniformly smooth boron hydride polymer which is deposited on the substrate.

Inventors:: Pearson, R K; Bystroff, R I; Miller, D E

Issue Date:: 1986-08-27

Research Org.:: Lawrence Livermore National Lab. (LLNL), Livermore, CA (United States)

OSTI Identifier:: 7078368

Patent Number(s):: RL-9136

Application Number:: ON: DE87007213

Assignee:: Dept. of Energy

DOE Contract Number:: W-7405-ENG-48

Resource Type:: Patent

Country of Publication:: United States

Language:: English

Subject:: 36 MATERIALS SCIENCE; BORON HYDRIDES; DEPOSITION; SUBSTRATES; SURFACE COATING; BORON COMPOUNDS; HYDRIDES; HYDROGEN COMPOUNDS; 360201* - Ceramics, Cermets, & Refractories- Preparation & Fabrication

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                    Pearson, R K, Bystroff, R I, and Miller, D E. Boron hydride polymer coated substrates.  United States: N. p., 1986. 
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                    Pearson, R K, Bystroff, R I, & Miller, D E. Boron hydride polymer coated substrates.  United States.

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                    Pearson, R K, Bystroff, R I, and Miller, D E. Wed .  
        "Boron hydride polymer coated substrates".  United States.

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@article{osti_7078368,

  title        = {Boron hydride polymer coated substrates},

  author       = {Pearson, R K and Bystroff, R I and Miller, D E},

  abstractNote = {A method is disclosed for coating a substrate with a uniformly smooth layer of a boron hydride polymer. The method comprises providing a reaction chamber which contains the substrate and the boron hydride plasma. A boron hydride feed stock is introduced into the chamber simultaneously with the generation of a plasma discharge within the chamber. A boron hydride plasma of ions, electrons and free radicals which is generated by the plasma discharge interacts to form a uniformly smooth boron hydride polymer which is deposited on the substrate.},

  doi          = {},

  journal      = {},
number       = ,

  volume       = ,

  place        = {United States},

  year         = {1986},

  month        = {8}

}

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