skip to main content
DOE Patents title logo U.S. Department of Energy
Office of Scientific and Technical Information

Title: Method of processing materials using an inductively coupled plasma

Abstract

A method of processing materials. The invention enables ultrafine, ultrapure powders to be formed from solid ingots in a gas free environment. A plasma is formed directly from an ingot which insures purity. The vaporized material is expanded through a nozzle and the resultant powder settles on a cold surface. An inductively coupled plasma may also be used to process waste chemicals. Noxious chemicals are directed through a series of plasma tubes, breaking molecular bonds and resulting in relatively harmless atomic constituents. 3 figs.

Inventors:
;
Issue Date:
Research Org.:
Los Alamos National Lab. (LANL), Los Alamos, NM (United States)
OSTI Identifier:
7043065
Patent Number(s):
6037898
Assignee:
TIC; EDB-88-179055
Patent Classifications (CPCs):
H - ELECTRICITY H01 - BASIC ELECTRIC ELEMENTS H01Q - ANTENNAS, i.e. RADIO AERIALS
H - ELECTRICITY H04 - ELECTRIC COMMUNICATION TECHNIQUE H04W - WIRELESS COMMUNICATION NETWORKS
DOE Contract Number:  
W-7405-ENG-36
Resource Type:
Patent
Resource Relation:
Other Information: Portions of this document are illegible in microfiche products
Country of Publication:
United States
Language:
English
Subject:
42 ENGINEERING; 54 ENVIRONMENTAL SCIENCES; AIR CLEANING SYSTEMS; DESIGN; CHEMICAL WASTES; INVENTIONS; NOZZLES; PLASMA; WASTE PROCESSING; ENGINEERED SAFETY SYSTEMS; MANAGEMENT; PROCESSING; WASTE MANAGEMENT; WASTES; 420900* - Engineering- Waste Processing Plants & Equipment- (-1989); 500200 - Environment, Atmospheric- Chemicals Monitoring & Transport- (-1989)

Citation Formats

Hull, D E, and Bieniewski, T M. Method of processing materials using an inductively coupled plasma. United States: N. p., 1987. Web.
Hull, D E, & Bieniewski, T M. Method of processing materials using an inductively coupled plasma. United States.
Hull, D E, and Bieniewski, T M. Mon . "Method of processing materials using an inductively coupled plasma". United States.
@article{osti_7043065,
title = {Method of processing materials using an inductively coupled plasma},
author = {Hull, D E and Bieniewski, T M},
abstractNote = {A method of processing materials. The invention enables ultrafine, ultrapure powders to be formed from solid ingots in a gas free environment. A plasma is formed directly from an ingot which insures purity. The vaporized material is expanded through a nozzle and the resultant powder settles on a cold surface. An inductively coupled plasma may also be used to process waste chemicals. Noxious chemicals are directed through a series of plasma tubes, breaking molecular bonds and resulting in relatively harmless atomic constituents. 3 figs.},
doi = {},
journal = {},
number = ,
volume = ,
place = {United States},
year = {1987},
month = {4}
}