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Title: Pretreatment process for forming a smooth surface diamond film on a carbon-coated substrate

A process is disclosed for the pretreatment of a carbon-coated substrate to provide a uniform high density of nucleation sites thereon for the subsequent deposition of a continuous diamond film without the application of a bias voltage to the substrate. The process comprises exposing the carbon-coated substrate, in a microwave plasma enhanced chemical vapor deposition system, to a mixture of hydrogen-methane gases, having a methane gas concentration of at least about 4% (as measured by partial pressure), while maintaining the substrate at a pressure of about 10 to about 30 Torr during the pretreatment. 6 figures.
Inventors:
; ; ;
Issue Date:
OSTI Identifier:
7037213
Assignee:
Univ. of California, Oakland, CA (United States) PTO; EDB-94-102047
Patent Number(s):
US 5308661; A
Application Number:
CNN: MSS-8996309; PPN: US 8-025433
Contract Number:
AC03-76SF00098
Resource Relation:
Patent File Date: 3 Mar 1993
Country of Publication:
United States
Language:
English
Subject:
36 MATERIALS SCIENCE; DIAMONDS; DEPOSITION; SUBSTRATES; SURFACE TREATMENTS; NUCLEATION; CARBON; ELEMENTAL MINERALS; ELEMENTS; MINERALS; NONMETALS; 360601* - Other Materials- Preparation & Manufacture