Poly(silyl silane) homo and copolymers
Abstract
Poly(silyl silanes) have been prepared. They have high photosensitivity and excellent resistance to oxygen-reactive ion etching processes. They are useful as photodepolymerizable photoresists, barrier layers, etc.
- Inventors:
- Issue Date:
- OSTI Identifier:
- 7027889
- Patent Number(s):
- 5039593
- Application Number:
- PPN: US 7-331122
- Assignee:
- SNL; EDB-94-110986
- DOE Contract Number:
- AC04-76DP00789
- Resource Type:
- Patent
- Resource Relation:
- Patent File Date: 31 Mar 1989
- Country of Publication:
- United States
- Language:
- English
- Subject:
- 37 INORGANIC, ORGANIC, PHYSICAL AND ANALYTICAL CHEMISTRY; 36 MATERIALS SCIENCE; 42 ENGINEERING; ORGANIC SILICON COMPOUNDS; CHEMICAL PREPARATION; USES; DEPOLYMERIZATION; ELECTRONIC CIRCUITS; ETCHING; FABRICATION; MASKING; ORGANIC POLYMERS; PHOTOSENSITIVITY; CHEMICAL REACTIONS; DECOMPOSITION; ORGANIC COMPOUNDS; POLYMERS; SENSITIVITY; SURFACE FINISHING; SYNTHESIS; 400201* - Chemical & Physicochemical Properties; 360600 - Other Materials; 426000 - Engineering- Components, Electron Devices & Circuits- (1990-)
Citation Formats
Zeigler, J K. Poly(silyl silane) homo and copolymers. United States: N. p., 1991.
Web.
Zeigler, J K. Poly(silyl silane) homo and copolymers. United States.
Zeigler, J K. Tue .
"Poly(silyl silane) homo and copolymers". United States.
@article{osti_7027889,
title = {Poly(silyl silane) homo and copolymers},
author = {Zeigler, J K},
abstractNote = {Poly(silyl silanes) have been prepared. They have high photosensitivity and excellent resistance to oxygen-reactive ion etching processes. They are useful as photodepolymerizable photoresists, barrier layers, etc.},
doi = {},
journal = {},
number = ,
volume = ,
place = {United States},
year = {1991},
month = {8}
}
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